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Selective Area Deposition of Conducting Palladium Films on Polyimide Resins

Published online by Cambridge University Press:  21 February 2011

Yoon-Gi Kim ,
S. Bialy ,
R.W. Miller ,
J.T. Spencer ,
P.A. Dowben  and
Saswati Datta
Yoon-Gi Kim
Affiliation:
Center for Molecular Electronics, Departments of Physics and Chemistry, Syracuse University, Syracuse, NY 13244–1130
S. Bialy
Affiliation:
Center for Molecular Electronics, Departments of Physics and Chemistry, Syracuse University, Syracuse, NY 13244–1130
R.W. Miller
Affiliation:
Center for Molecular Electronics, Departments of Physics and Chemistry, Syracuse University, Syracuse, NY 13244–1130
J.T. Spencer
Affiliation:
Center for Molecular Electronics, Departments of Physics and Chemistry, Syracuse University, Syracuse, NY 13244–1130
P.A. Dowben
Affiliation:
Center for Molecular Electronics, Departments of Physics and Chemistry, Syracuse University, Syracuse, NY 13244–1130
Saswati Datta
Affiliation:
International Business Machines, 1701 North Street, Endicott, NY 13760
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Abstract

We have demonstrated that the selective area deposition of palladium on polyimide substrates is possible through the U.V. photolysis of (π-allyl)(π-cyclopentadienyl) palladium. This photolytic deposition process did not result in any apparent damage to either the Ultem 1000 (polyetherimide) or Kapton substrates (polyimide substrates). The resistivity of the palladium films (< 0.lum) suggests that the films are porous.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 103
Copyright
Copyright © Materials Research Society 1990

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References

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