Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-25T15:38:27.103Z Has data issue: false hasContentIssue false
  • English
  • Français

Secondary Grain Growth and Graphoepitaxy in thin Au films on Submicrometer-Period Gratings

Published online by Cambridge University Press:  22 February 2011

Chee C. Wong ,
Henry I. Smith  and
C. V. Thompson
Chee C. Wong
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA 02139.
Henry I. Smith
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA 02139.
C. V. Thompson
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA 02139.
Get access

Abstract

Secondary grain growth in thin Au films on SiO2 substrates with periodic surface relief structures was studied as a model for the application of graphoepitaxy (the growth of orientated crystalline films through the use of artificial surface patterning). Secondary grain growth driven by sur-face energy anisotropy produces grains many times larger than the film thickness with uniform texture. In thin films of Au on SiO2, surface-energy- driven secondary grain growth was found to occur at room temperature as soon as the film becomes continuous, and was shown to be responsible for the {111} deposition texture. A square-wave-profile grating of 0.2 μm period, etched into the surface of the substrate, resulted in preferred growth of {111}-textured grains with <112> directions oriented parallel to the grating axis. It is proposed that surface energy minimization is responsible for this phenomenon.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 47: Symposium C – Thin Films: The Relationship of Structure to Properties , 1985 , 35
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Cahn, R.W., in “Physical Metallurgy”, Chapter 19, (North Holland, Amsterdam, edited by Cahn, R.W., 1970).Google Scholar
2. Thompson, C.V., to be published in J. Appl. Phys.Google Scholar
3. Gangulee, A. and D'Heurle, F.M., Thin Solid Films 12, 399 (1972).CrossRefGoogle Scholar
4. Thompson, C.V. and Smith, H.I., Appl. Phys. Lett. 44, 603 (1984).Google Scholar
5. Yonehara, T., Thompson, C.V. and Smith, H.I., Materials Research Society Proc. 25, 517 (1984).Google Scholar
6. Yonehara, T., Smith, H.I., Thompson, C.V., and Palmer, J.E., Appi. Phys. Lett. 45, 631 (1984).Google Scholar
7. Alessandrini, E.I., Aboelfotoh, M.O., Laibowitz, R.B. and Lacey, J.A., presented at the 1985 Materials Research Society Symposium, San Francisco, CA, April 15–18, 1985.Google Scholar