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Scanning Tunneling Microscopy Study of the Dynamic Scaling Properties of Rough Vapor-Deposited Silver Films

Published online by Cambridge University Press:  15 February 2011

G. Palasantzas
Affiliation:
Northeastern University, Department of Physics, Boston MA 02115
J. Krim
Affiliation:
Northeastern University, Department of Physics, Boston MA 02115
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Abstract

We investigated the scaling behaviour of vapor-deposited silver films at room temperature by means of scanning tunneling Microscopy. The film-thickness range was ≈ 10 – 1000 nm. The roughness exponent H is observed to be H = 0.82 ± 0.05. The growth and dynamic scaling exponents are respectively observed to be β = 0.29 ± 0.06, and z = 2.53 ±0.50.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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