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Saturation, Exchange and Retention of Implanted D/H Ions in Fused Silica

Published online by Cambridge University Press:  15 February 2011

B. L. Doyle  and
G. W. Arnold
B. L. Doyle
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico, USA
G. W. Arnold
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico, USA
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Abstract

Elastic recoil detection techniques have been used to measure hydrogen isotope profiles in fused silica implanted with 20 keV H and/or D ions. Saturation is obtained for both H and D implantations at a concentration of 2.2 × 1021 ions/cm3. H and D exchange are observed for saturated samples subsequently implanted with a different H isotope. A previously developed local mixing model of H-trapping has been extended to include retrapping and beam-induced detrapping for application to these studies. This theoretical analysis provides a good fit to the H/D saturation and isotope exchange behavior. Isochronal annealing shows that both H and D are released in a single stage centered about 550°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 7 , 1981 , 409
Copyright
Copyright © Materials Research Society 1982

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Footnotes

*

This work performed at Sandia National Laboratories supported by the U.S. Department of Energy under contract number DE-AC04-76DP00789.

References

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