Hostname: page-component-745bb68f8f-b6zl4 Total loading time: 0 Render date: 2025-02-05T14:42:40.425Z Has data issue: false hasContentIssue false
  • English
  • Français

Rutherford Scattering-Channeling Analysis of Semiconductor Interfaces

Published online by Cambridge University Press:  15 February 2011

L. C. Feldman
L. C. Feldman*
Affiliation:
Bell Laboratories, Murray Hill, NJ07974, (U.S.A.)
Get access

Abstract

The main concepts in ion scattering analysis of interfaces are reviewed and relevant literature is cited.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 18: Symposium C – Interfaces and Contacts , 1982 , 3
Copyright
Copyright © Materials Research Society 1982

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Chu, W. K. Mayer, J. W. and Nicolet, M.A., Backscattering Spectrometry, Academic Press, New York, 1978.CrossRefGoogle Scholar
2 Ziegler, J. F., Helium–stopping Powers and Ranges in All Elements, Pergamon, Oxford, 1977.Google Scholar
3 Feldman, L. C. and Poate, J. M., Annu. Rev. Mater. Sci., 12 (1982) 149.CrossRefGoogle Scholar
4 Mayer, J. W. and Rimini, E. (eds.), Ion Beam Handbook for Material Analysis, Academic Press, New York, 1977.Google Scholar
5 Feldman, L. C. Mayer, J. W. and Picraux, S. T., Materials Analysis by Ion Channeling, Academic Press, New York, 1982.Google Scholar
6 Feldman, L. C., Crit. Rev. Solid State Mater. Sci., 10(27) (1981) 143.CrossRefGoogle Scholar
7 Feldman, L. C., Nucl. Instrum. Methods, 191 (1981) 211.CrossRefGoogle Scholar
8 Stensgaard, I. Feldman, L. C. and Silverman, P. J., Surf. Sci., 77 (1978) 513.CrossRefGoogle Scholar
9 Turkenburg, W. C. Sosyka, W. Saris, F. W. Kristen, H. H. and Colenbrender, B. C., Nucl. Instrum. Methods, 132 (1976) 587.CrossRefGoogle Scholar
10 van der Veen, J. F. Tromp, R. M. Smeenk, R. G. and Saris, F. W., Nucl. Instrum Methods, 171 (1980) 143.CrossRefGoogle Scholar
11 Cheung, N. W. Ph.D. Thesis, California Institute of Technology, 1980.Google Scholar
12 Cheung, N. W., Feldman, L. C., Silverman, P. J. and Stensgaard, I., Appl. Phys. Lett., 35 (1979) 859. CrossRefGoogle Scholar
13 Cheung, N. W. and Feldman, L. C., to be published.Google Scholar
14 Feldman, L. C., Stensgaard, I., Silverman, P. J. and Jackman, T. E. in Pantelides, S. T. (ed.), Proc. Int. Conf. on Physics of SiO2 and its Interfaces, Pergamon, Oxford, 1978, p. 344.CrossRefGoogle Scholar
15 Haight, R. and Feldman, L. C., J. Appl. Phys., 53 (1982) 4884. CrossRefGoogle Scholar
16 Poate, J. M., Silverman, P. J. and Yahalom, J., J. Phys. Chem. Solids, 34 (1973) 1847.CrossRefGoogle Scholar
17 Morgan, D. V. and Bogh, E., Surf. Sci., 32 (1972) 278.CrossRefGoogle Scholar
18 Wood, D. R. and Morgan, D. V., J. Electrochem Soc., 22 (1975) 773.CrossRefGoogle Scholar
19 Cheung, N. W., Culbertson, R. J., Feldman, L. C., Silverman, P. J., West, K. W. and Mayer, J. W., Phys. Rev. Lett., 45 (1980) 120.CrossRefGoogle Scholar
20 Tromp, R. M., van Loenen, E. J., Iwami, M., Smenk, R. and Saris, F. W., Thin Solid Films, 93 (1982) 151.CrossRefGoogle Scholar
21 Narusawa, T., Gibson, W. M. and Hiraki, A., Phys. Rev. B, 24 (1981) 4835.CrossRefGoogle Scholar
22 van Loenen, E. J., Iwami, M., Tromp, R. M., van der Veen, J. F. and Saris, F. W., Thin Solid Films, 104 (1983) 9.CrossRefGoogle Scholar
23 Narusawa, T., Kinoshita, K., Gibson, W. M. and Hiraki, A., J. Vac. Sci. Technol., 18 (1981) 872.CrossRefGoogle Scholar
24 Nartsawa, T. and Gibson, W. M., Phys. Rev. Lett., 47 (1981) 1459.CrossRefGoogle Scholar
25 Chiu, K. C. R., Poate, J. M., Feldman, L. C. and Doherty, C. J., Appl. Phys. Lett., 36 (1980) 544.CrossRefGoogle Scholar
26 Petroff, P. M., Feldman, L. C., Cho, A. Y. and Williams, R. S., Appl., J. Phys., 52 (1981) 7317.Google Scholar
27 Saris, F. W., Chu, W. K., Chang, C. A., Ludeke, R. and Esaki, L., Appl. Phys. Lett., 37 (1980) 921.CrossRefGoogle Scholar
28 Chu, W. K., Saris, F. W., Chang, C. A., Ludeke, R. and Esaki, L., Phys. Rev. B, 26 (1982) 1999.CrossRefGoogle Scholar
29 Picraux, S. T. and Rai-Chadbury, P in Barnes, P. A. and Rozgonyi, G. A. (eds.), Semiconductor Characterization Techniques, Electrochemical Society, Princeton, NJ, 1978, p. 447.Google Scholar