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Routes towards large area, low pressure nanodiamond growth via pulsed microwave linear antenna plasma chemistry

Published online by Cambridge University Press:  14 March 2011

Michael Liehr ,
František Fendrych ,
Andrew Taylor  and
Miloš Nesládek
Michael Liehr
Affiliation:
Leybold Optics Dresden GmbH, Dresden, Germany
František Fendrych
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague 8, Czech Republic
Andrew Taylor
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague 8, Czech Republic
Miloš Nesládek
Affiliation:
IMOMEC division, IMEC, Institute for Materials Research, University Hasselt, Wetenschapspark 1, B3590 Diepenbeek, Belgium
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Abstract

Current experimental configurations for MW PECVD diamond growth do not allow simple up-scaling towards large areas, which is essential for microelectronic industries and other applications. Another important issue is the reduction of the substrate temperature during diamond growth to enhance the compatibility with wafer processing technologies. Such advantages are provided by MW-linear antenna (LA) plasma applicators, allowing a scalable concept for diamond growing plasmas. In the present work we introduce a novel construction of LA MW applicators designed for nanodiamond growth by using plasmas ranging from continuous wave (CW) to high repetition rates pulsed modes (up to 20 kHz) which advantages are discussed in detail.

Keywords

diamondplasma-enhanced CVD (PECVD) (deposition)nanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1282: Symposium A – Diamond Electronics and Bioelectronics—Fundamentals to Applications IV , 2011 , mrsf10-1282-a03-01
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

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