Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-17T16:07:54.894Z Has data issue: false hasContentIssue false
  • English
  • Français

Rotating-Compensator Multichannel Ellipsometry: Applications in Process Development for Nanocrystalline Diamond Thin Films

Published online by Cambridge University Press:  10 February 2011

R. W. Collins ,
Joungchel Lee ,
P. I. Rovira  and
Ilsin An
R. W. Collins
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
Joungchel Lee
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
P. I. Rovira
Affiliation:
Materials Research Laboratory and Department of Physics, The Pennsylvania State University, University Park, PA 16802.
Ilsin An
Affiliation:
Department of Physics, Han Yang University, Ansan, Seoul, Korea.
Get access

Abstract

A multichannel spectroscopic ellipsometer based on the rotating-compensator principle was developed and applied to characterize nanocrystalline diamond thin film growth processes by plasma-enhanced chemical vapor deposition (PECVD). With the newly-designed instrument, a time resolution of 32 ms is possible for spectra (1.5˜4.0 eV) in the Stokes vector of the light beam reflected from the surface of the growing film. Several advantages of the rotating-compensator over the simpler rotating-polarizer multichannel ellipsometer design are demonstrated here for diamond thin film growth. These include the ability to: (i) resolve the sign ambiguity in the p–s wave phase-shift difference Δ, (ii) obtain accurate Δ values for low ellipticity polarization states, and (iii) deduce spectra in the degree of polarization of the light beam reflected from the film/substrate. The degree of polarization has been applied to characterize the time evolution of light scattering during the nucleation of the diamond, as well as the time evolution of thickness non-uniformity over the probed area of the growing film. In this paper, a brief description of calibration and data reduction for the new instrument is also provided.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 502: Symposium II – In Situ Process Diagnostics & Intelligent Materials Processing , 1997 , 23
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. An, I., Li, Y. M., Nguyen, H. V., and Collins, R. W., Rev. Sci. Instrum. 63, 3842 (1992).Google Scholar
2. Hauge, P. S., Surf. Sci. 96, 108 (1980).Google Scholar
3. Collins, R. W., Rev. Sci. Instrum. 61, 2029 (1990).Google Scholar
4. Hauge, P. S. and Dill, F. H., Opt. Commun. 14, 431 (1975).Google Scholar
5. Hauge, P. S., Opt. Commun. 17, 74 (1976).Google Scholar
6. Hauge, P. S., Surf. Sci. 56, 148 (1976).Google Scholar
7. Aspnes, D. E. J. Opt. Soc. Am. 65, 1274 (1975).Google Scholar
8. Aspnes, D. E., Surf. Sci. 56, 161 (1976).Google Scholar
9. Nguyen, N. V., Pudliner, B. S., An, I., and Collins, R. W., J. Opt. Soc. Am. A 8, 919 (1991).Google Scholar
10. Hong, B., Ph.D. Thesis, The Pennsylvania State University, University Park, PA, 1996.Google Scholar
11. An, I. and Collins, R. W., Rev. Sci. Instrum. 62, 1904 (1991).Google Scholar
12. Hong, B., Wakagi, M., Drawl, W., Messier, R., and Collins, R. W., Phys. Rev. Lett. 75, 1122(1995).Google Scholar
13. Hong, B., Lee, J., Collins, R. W., Kuang, Y., Tsong, T. T., Drawl, W., Messier, R., and Strausser, Y. E., Diamond Relat. Mater. 6, 55 (1997).Google Scholar
14. Wakagi, M., Hong, B., Nguyen, H. V., Collins, R. W., Drawl, W., and Messier, R., J. Vac. Sci.Technol. 13, 1917 (1995).Google Scholar
15. Lee, J., Hong, B., Messier, R., and Collins, R. W., J. Appl. Phys. 80, 6489 (1996).Google Scholar
16. Lee, J., Collins, R. W., Messier, R., and Strausser, Y. E., Appl. Phys. Lett. 70, 1527 (1997).Google Scholar
17. Robertson, J. and O'Reilly, E. P., Phys. Rev. B 35, 2946 (1987).Google Scholar
18. Jellison, G. E. Jr and cCamy, J. W., Appl. Phys. Lett. 61, 512 (1992).Google Scholar
19. Maynard, H. L., Layadi, N., and Lee, J. T. C., J. Vac. Sci. Technol. B 15, 109 (1997).Google Scholar