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Role of SrTiO3 Seed Layer on Low-temperature Crystallization of Pb(Zr, Ti)O3 Films Prepared by Metalorganic Chemical Vapor Deposition

Published online by Cambridge University Press:  01 February 2011

Ji-Won Moon ,
Naoki Wakiya ,
Takanori Kiguchi ,
Tomohiko Yoshioka ,
Tanaka Junzo  and
Kazuo Shinozaki
Ji-Won Moon
Affiliation:
[email protected], Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science, 2-12-1 O-Okayama, Meguro-ku, Tokyo, 152-8552, Japan, +81-3-5734-2518, +81-3-5734-3369
Naoki Wakiya
Affiliation:
[email protected], Shizuoka University, Department of Materials and Chemical Engineering, 3-5-1 Johoku, Hamamatsu, Shizuoka, 432-8561, Japan
Takanori Kiguchi
Affiliation:
[email protected], Tohoku University, Institute for Materials Research, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan
Tomohiko Yoshioka
Affiliation:
[email protected], Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science, 2-12-1 O-Okayama, Meguro-ku, Tokyo, 152-8552, Japan
Tanaka Junzo
Affiliation:
[email protected], Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science, 2-12-1 O-Okayama, Meguro-ku, Tokyo, 152-8552, Japan
Kazuo Shinozaki
Affiliation:
[email protected], Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science, 2-12-1 O-Okyama, Meguro-ku, Tokyo, 152-8552, Japan
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Abstract

Role of SrTiO3 seed layer on low-temperature crystallization of Pb(Zr, Ti)O3 (PZT) film was investigated. The SrTiO3 seeds were prepared by pulsed laser deposition (PLD) with the temperature range of 400-600 °C and PZT films were prepared by thermal MOCVD. The pyrochlore free PZT films can be successfully crystallized at around 340 °C on SrTiO3 seed layers by thermal MOCVD. It was found that the role of SrTiO3 seed layer is not only pyrochlore suppression but also perovskite promotion. It is also considered that crystallinity, surface coverage and seed layer thickness are important parameters for low-temperature crystallization and electrical properties of PZT films.

Keywords

ferroelectricthin filmchemical vapor deposition (CVD) (deposition)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1034 , 2007 , 1034-K10-28
Copyright
Copyright © Materials Research Society 2008

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