Secondary-gate electrodes are introduced in organic thin-film transistors to reduce carrier-injection barriers into air-stable organic semiconductors. The additional gate electrodes buried in the gate insulators under the source and drain electrodes form “carrier-rich regions” in the vicinity of source and drain electrodes with the application of sufficiently high local electric fields. Fabricating the structure with dinaphtho[2,3-b:2′,3′-f]thieno[3,2-b]thiophene, known for its excellent air-stability, it turned out that the contact resistance is drastically reduced especially when operated at low gate voltage in the main channel. The result demonstrates carrier injection with a minimized potential barrier realizing that from the same semiconductor material in the absence of peculiar interfacial trap levels at metal-to-semiconductor junctions.