Hostname: page-component-cd9895bd7-mkpzs Total loading time: 0 Render date: 2024-12-27T01:31:39.934Z Has data issue: false hasContentIssue false
  • English
  • Français

Recent Advances in UV Laser Photodeposition

Published online by Cambridge University Press:  21 February 2011

J. Y. Tsao  and
D. J. Ehrlich
J. Y. Tsao
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
D. J. Ehrlich
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
Get access

Abstract

Techniques for laser-photochemically depositing localized thin films are reviewed. A comparison is made between techniques relying on gas-phase and surface-phase photochemistry. New photoreactions, confined entirely to surface phases, are described, including multimolecular reactions based on methyl methacrylate, and multicomponent reactions based on mixtures of trimethylaluminum and titanium tetrachloride. Recent developments in the use of surface photochemistry to nucleate subsequent growth by pyrolytic chemical vapor deposition are also reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 115
Copyright
Copyright © Materials Research Society 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCE

1. Ehrlich, D. J. and Tsao, J. Y., J. Vac. Sci. Technol. (Nov./Dec., 1983) to be published.Google Scholar
2. Osgood, R. M., Brueck, S. R. J. and Schlossberg, H. R., eds. Laser Diagnostics and Photochemical Processing for Semiconductor Devices (North-Holland, New York, 1983); see also other articles in this Volume.Google Scholar
3. Ehrlich, D. J., Osgood, R. M. and Deutsch, T. F., J. Vac. Sci. Technol. 21, 23 (1982).CrossRefGoogle Scholar
4. Young, D. M. and Crowell, A. D., Physical Adsorption of Gases (Butterworths, London, 1962).Google Scholar
5. Wood, T. H., White, J. C. and Thacker, B. A. Appl. Phys. Lett. 42, 408 (1983).CrossRefGoogle Scholar
6. Chuang, T. J., Surf. Sci. Reports, Vol. 3 (1983), to be published.CrossRefGoogle Scholar
7. Chen, C. J. and Osgood, R. M., Appl. Phys. A 31, 171 (1983).CrossRefGoogle Scholar
8. Houle, F. A., Chem. Phys. Lett. 95, 5 (1983).CrossRefGoogle Scholar
9. Bottka, N., Walsh, P. J. and Dalbey, R. Z., J. Appl. Phys. 54, 1104 (1983).CrossRefGoogle Scholar
10. Ehrlich, D. J. and Tsao, J. Y., in Surface Studies With Lasers, Aussenegg, F. R., Leitner, A. and Lippitsch, M. E., eds. (Springer-Verlag, Berlin, 1983), pp. 171–176.CrossRefGoogle Scholar
11. Tsao, J. Y., Becker, R. A., Ehrlich, D. J. and Leonberger, F. J., Appl. Phys. Lett. 42, 559 (1983).CrossRefGoogle Scholar
12. Tsao, J. Y. and Ehrlich, D. J., Appl. Phys. Lett. 42, 997 (1983).CrossRefGoogle Scholar
13. Tsao, J. Y. and Ehrlich, D. J., to be published.Google Scholar