Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Larsen, P.K.
Spierings, G.A.C.M.
Cuppens, R.
and
Dormans, G.J.M.
1993.
Ferroelectrics and high permittivity dielectrics for memory applications.
Microelectronic Engineering,
Vol. 22,
Issue. 1-4,
p.
53.
Spierings, G.A.C.M.
Dormans, G.J.M.
Moors, W.G.J.
Ulenaers, M.J.E.
and
Larsen, P.K.
1994.
Stress in Pt/Pb(Zr,Ti)O/sub 3//Pt capacitors for integrated ferroelectric devices.
p.
29.
Pan, W.
Thio, C.L.
Desu, S.B.
and
Chung, Cheewon
1994.
Reactive Ion Etching Damage to Ferroelectric Thin Films Capacitors.
MRS Proceedings,
Vol. 361,
Issue. ,
Spierings, G. A. C. M.
Dormans, G. J. M.
Moors, W. G. J.
Ulenaers, M. J. E.
and
Larsen, P. K.
1995.
Stresses in Pt/Pb(Zr,Ti)O3/Pt thin-film stacks for integrated ferroelectric capacitors.
Journal of Applied Physics,
Vol. 78,
Issue. 3,
p.
1926.
Chung, Chee Won
Lee, Wan In
and
Lee, June Key
1995.
Dry etching of Pt/PbZrxTi1−xO3/Pt thin film capacitors in an inductively coupled plasma (ICP).
Integrated Ferroelectrics,
Vol. 11,
Issue. 1-4,
p.
259.
Dormans, G. J. M.
Larsen, P. K.
Spierings, G. A.C.M.
Dikken, J.
Ulenaers, M. J. E.
Cuppens, R.
Taylor, D. J.
and
Verhaar, R. D. J.
1995.
Processing and performance of integrated ferroelectric and CMOS test structures for memory applications.
Integrated Ferroelectrics,
Vol. 6,
Issue. 1-4,
p.
93.
Achard, H.
and
Mace, H.
1995.
Science and Technology of Electroceramic Thin Films.
p.
353.
Williams, K.
Hayes, A.
DiStefano, S.
Huang, O.
and
Ostan, E.
1996.
Reactive ion beam etching of ferroelectric materials using an RF inductively coupled ion beam source.
Vol. 2,
Issue. ,
p.
783.
Chung, Chee Won
Kim, Chang Jung
Lee, June Key
and
Chung, Ilsub
1996.
Etching effects on ferroelectric capacitors with multilayered electrodes.
Integrated Ferroelectrics,
Vol. 13,
Issue. 1-3,
p.
129.
Milkove, Keith R.
and
Wang, Cindy X.
1997.
Analysis of a fence-free platinum etch process.
Integrated Ferroelectrics,
Vol. 17,
Issue. 1-4,
p.
403.
1997.
Dry Etching Damage In Pt/Pb(Zr, Ti)O3/Pt Capacitors Patterned By A Single Photolithography Process Step.
p.
221.
Chung, Chee Won
Song, Inyong
and
Lee, Jong Sig
1997.
Investigation of ETCH Profiles in Etching of PZT and Pt Thin Films.
MRS Proceedings,
Vol. 493,
Issue. ,
Farrell, Curtis E.
Milkove, K. R.
Wang, Cindy
and
Kotecki, David E.
1997.
A reactive ion etch study for producing patterned platinum structures.
Integrated Ferroelectrics,
Vol. 16,
Issue. 1-4,
p.
109.
Milkove, K. R.
Coffin, J. A.
and
Dziobkowski, C.
1998.
Effects of argon addition to a platinum dry etch process.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
Vol. 16,
Issue. 3,
p.
1483.
Jang, Byung-Tak
Kwak, Dong-Hwa
Cha, Seon-Yong
Lee, Seung-Hoon
and
Lee, Hee Chul
1998.
A simple method for high-frequency characterization of (Ba,Sr)TiO3 thin film capacitors.
Integrated Ferroelectrics,
Vol. 20,
Issue. 1-4,
p.
215.
Kim, J. H.
and
Woo, S. I.
1998.
Chemical Dry Etching of Platinum Using Cl2/CO Gas Mixture.
Chemistry of Materials,
Vol. 10,
Issue. 11,
p.
3576.
Chung, Chee Won
1998.
Reactive ion etching of Pb(ZrxTi1−x)O3 thin films in an inductively coupled plasma.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Vol. 16,
Issue. 4,
p.
1894.
Zeto, R.
Rod, B.
Dubey, M.
Ervin, M.
Conrad, J.
Piekarz, R.
Troliermckinstry, S.
Su, T.
and
Shepard, J.
1998.
Dry Etching of Sol-Gel Pzt.
MRS Proceedings,
Vol. 546,
Issue. ,
Milkove, Keith R.
1998.
Dry etching of (Ba, Sr)TiO3with Cl2, SF6, and CF4.
Integrated Ferroelectrics,
Vol. 21,
Issue. 1-4,
p.
53.
Jin Hong Kim
Seong Ihl Woo
Byung Yun Nam
and
Won Jong Yoo
1999.
Anisotropic etching characteristics of platinum electrode for ferroelectric capacitor.
IEEE Transactions on Electron Devices,
Vol. 46,
Issue. 5,
p.
984.