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Rapid large-scale Characterization of CVD Graphene Layers on Glass using Fluorescence Quenching Microscopy

Published online by Cambridge University Press:  30 August 2011

Jennifer Reiber Kyle ,
Ali Guvenc ,
Wei Wang ,
Jian Lin ,
Maziar Ghazinejad ,
Cengiz Ozkan  and
Mihrimah Ozkan
Jennifer Reiber Kyle
Affiliation:
Department of Electrical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Ali Guvenc
Affiliation:
Department of Electrical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Wei Wang
Affiliation:
Department of Materials Science & Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Jian Lin
Affiliation:
Department of Mechanical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Maziar Ghazinejad
Affiliation:
Department of Mechanical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Cengiz Ozkan
Affiliation:
Department of Materials Science & Engineering, University of California-Riverside, Riverside, CA 92521, USA. Department of Mechanical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
Mihrimah Ozkan
Affiliation:
Department of Electrical Engineering, University of California-Riverside, Riverside, CA 92521, USA.
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Abstract

The exceptional electrical, optical, and mechanical properties of graphene make it a promising material for many industrial applications such as solar cells, semiconductor devices, and thermal heat sinks. However, the greatest obstacle in the use of graphene in industry is high-throughput scaling of its production and characterization. Chemical-vapor deposition growth of graphene has allowed for industrial-scale graphene production. In this work we introduce complimentary high-throughput metrology technique for characterization of chemical-vapor deposition-grown graphene. This metrology technique provides quick identification of thickness and uniformity of entire large-area chemical-vapor deposition-grown graphene sheets on a glass substrate and allows for easy identification of folds and cracks in the graphene samples. This metrology technique utilizes fluorescence quenching microscopy, which is based on resonant energy transfer between a dye molecule and graphene, to increase allow graphene visualization on the glass substrate and increase the contrast between graphene layers.

Keywords

nanostructuremorphologyoptical
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1344: Symposium Y – Functional Two-Dimensional Layered Materials—From Graphene to Topological Insulators , 2011 , mrss11-1344-y06-02
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

1. Castro Neto, A., Guinea, F., Peres, N., Novoselov, K., Geim, A., Rev. Mod. Phys. 81, 109–162 (2009).Google Scholar
2. Geim, A., Novoselov, K., Nat. Mater. 6, 183–191 (2007).Google Scholar
3. Novoselov, K., Geim, A., Morozov, S., Jiang, D., Zhang, Y., Dubonos, S., Grigorieva, I., Firsov, A., Science 306, 666–669 (2004).Google Scholar
4. Nair, R. R., Blake, P., Grigorenko, A. N., Novoselov, K. S., Booth, T. J., Stauber, T., Peres, N. M. R., Geim, A. K., Science 320, 1308 (2008).Google Scholar
5. Ferrari, A. C., Meyer, J. C., Scardaci, V., Casiraghi, C., Lazzeri, M., Mauri, F., Piscanec, S., Jiang, D., Novoselov, K. S., Roth, S., Geim, A. K., Phys. Rev. Lett. 97, 187401 (2006).Google Scholar
6. Stankovich, S., Dikin, D. A., Dommett, G. H. B., Kohlhaas, K. M., Zimney, E. J., Stach, E. A., Piner, R. D., Nguyen, S. T., Ruoff, R. S., Nature 442, 282–286 (2006).Google Scholar
7. Reina, A., Thiele, S., Jia, X., Bhaviripudi, S., Dresselhaus, M., Schaefer, J., Kong, J., Nano. Res. 2, 509–516 (2009).Google Scholar
8. Nolen, C. M., Denina, G., Teweldebrhan, D., Bhanu, B., Balandin, A. A., ACS Nano 5(2) 914–922 (2011).Google Scholar
9. Kim, J., Cote, L., Kim, F., Huang, J., Am, J.. Chem. Soc. 132, 260–267 (2010).Google Scholar