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Raman Scattering Characterization of Implanted ZnO

Published online by Cambridge University Press:  01 February 2011

Esther Alarcon-Llado
Affiliation:
[email protected], C.S.I.C., Inst. Jaume Almera, C. Sole Sabaris sn, Barcelona 08028, Spain
Ramon Cusco
Affiliation:
[email protected], C.S.I.C., Inst. Jaume Almera, C. Sole Sabaris sn, Barcelona, 08028, Spain
Luis Artus
Affiliation:
[email protected], C.S.I.C., Inst. Jaume Almera, C. Sole Sabaris sn, Barcelona, 08028, Spain
German Gonzalez-Diaz
Affiliation:
[email protected], Univ. Complutense, Dep. Fisica Aplicada III, Madrid, 28040, Spain
Ignacio Martil
Affiliation:
[email protected], Univ. Complutense, Dep. Fisica Aplicada III, Madrid, 28040, Spain
Juan Jimenez
Affiliation:
[email protected], Univ. Valladolid, Dep. Fisica Materia Condensada, P. del Cauce sn, Valladolid, 47011, Spain
Buguo Wang
Affiliation:
[email protected], Solid State Scientific Corporation, 27-2 Wright Road, Hollis, NH, 03049, United States
Michael Callahan
Affiliation:
[email protected], Air Force Research Laboratory, Sensors Directorate, Hanscom AFB, MA, 01731-2909, United States
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Abstract

In this work we investigate the lattice damage induced in ZnO implanted with potential group V acceptors by means of Raman scattering. ZnO samples were implanted with N and P to high doses and Raman spectra were obtained prior and after rapid thermal annealing (RTA). Characteristic disorder-activated modes are observed in the spectra that can be used to assess the degree of lattice damage. ZnO samples were also implanted with native Zn+ and O+ ions under similar conditions to study specific effects of implantation with N+ and P+. As revealed by the intensity of disorder-activated bands, the implantation induced lattice damage is considerably higher for Zn+ than for the lighter O+ ion. In samples implanted with N+ additional Raman peaks emerge that are not observed either in the samples implanted with the native Zn+ and O+ ions or in the samples implanted with P+, thus pointing to a local vibrational mode of N or a N complex as the origin of these modes. Disorder-activated features are fully removed by RTA, indicating a high degree of lattice recovery by RTA even for the heavily damaged ZnO samples implanted with Zn+.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Look, D. C. and Chaflin, B., Phys. Stat. Sol. (b) 241, 624 (2004).Google Scholar
2. Lee, E-C, Kim, Y-S, Jin, Y-G and Chang, K. J., Phys. Rev. B 64, 085120 (2001).Google Scholar
3. Braunstein, G., Muraviev, A., Saxena, H., Dhere, N., Richter, V., and Kalish, R., Appl. Phys. Lett. 87, 192103 (2005).Google Scholar
4. Suscavage, M., Harris, M., Bliss, D., Yip, P., Wang, S. Q., Schwall, D., Bouthillette, L., Bailey, J., Callahan, M., Look, D. C., Reynolds, D. C., Jones, R. L., and Litton, C. W., MRS Internet J. Nitride Semicond. Res. 4S1, G3.40 (1999).Google Scholar
5. Serrano, J., Romero, A. H., Manjón, F. J., Lauck, R., Cardona, M., and Rubio, A., Phys. Rev. B 69, 094306 (2004).Google Scholar
6. Reuss, F., Kirchner, C., Gruber, Th., Kling, R., Maschek, S., Limmer, W., Waag, A., and Ziemann, P., J. Appl. Phys. 95, 3385 (2004).Google Scholar
7. Kaschner, A., Haboek, U., Strassburg, M., Strassburg, M., Kaczmarczyk, G., Zeuner, Z., Alves, H. R., Hoffmann, D. M., and Meyer, B. K., Appl. Phys. Lett. 80, 1909 (2002).Google Scholar
8. Bundesmann, C., Ashkenov, N., Schubert, M., Spemann, D., Butz, T., Kaidashev, E. M., Lorentz, M., and Grundmann, M., Appl. Phys. Lett. 83, 1974 (2003).Google Scholar
9. Wang, J. B., Zhong, H. M., Li, Z. F., and Lu, W., Appl. Phys. Lett. 88, 101913 (2006).Google Scholar
10. Pastor, D., Ibáñez, J., Cuscó, R., Artús, L., González-Díaz, G., and Calleja, E., Semicond. Sci. Technol. 22, 70 (2007).Google Scholar
11. Yu, J., Xing, H, Zhao, Q., Mao, H., Shen, Y., Wang, J., Lai, Z., Zhu, Z., Solid State Commun. 138, 502 (2006).Google Scholar