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Quantitative X-Ray Microanalysis for the Study of Nanometer-Scale Phases in the Aem

Published online by Cambridge University Press:  21 February 2011

Ian M. Anderson
Affiliation:
Oak Ridge National Laboratory, Metals and Ceramics Division, P. 0. Box 2008, M. S. 6376, Oak Ridge, TN 37831-6376 University of Minnesota, Department of Chemical Engineering and Materials Science, 421 Washington Ave. S. E., Minneapolis, MN 55455-0132
Jim Bentley
Affiliation:
Oak Ridge National Laboratory, Metals and Ceramics Division, P. 0. Box 2008, M. S. 6376, Oak Ridge, TN 37831-6376
C. Barry Carter
Affiliation:
University of Minnesota, Department of Chemical Engineering and Materials Science, 421 Washington Ave. S. E., Minneapolis, MN 55455-0132
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Abstract

Secondary excitation can be a large source of inaccuracy in quantitative X-ray microanalysis of inhomogeneous specimens in the AEM. The size of the secondary excitation component in the measured X-ray spectrum is sensitive to the geometry of the thin foil specimen. Secondary excitation has been examined in a self-supporting disc specimen of composition NiO-20 wt.% TiO2 which has been partially masked by a gold slot washer. The ratio of the intensities of the characteristic Kα peaks of Ti and Ni in X-ray spectra from a periclase-structured phase, of nominal composition NiO, has been measured to be NTi / NNi ≈ 0.005. There is no apparent Ti L2,3 signal in the corresponding electron energy-loss spectrum. The secondary excitation contribution to the characteristic Ti Ka-peak from all sources can therefore be no larger than 0.5%. It should be possible to reduce this modest level of secondary excitation still further with a better masking arrangement.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1. Bentley, J., in Analytical Electron Microscopy - 1981, edited by Geiss, R. H. (San Francisco Press, San Francisco, CA, 1981), pp. 5456.Google Scholar
2. Kenik, E. A. and Bentley, J., in Microbeam Analysis - 1990, edited by Michael, J. R. and Ingram, P. (San Francisco Press, San Francisco, CA, 1990), pp. 289292.Google Scholar
3. Bentley, J., Angelini, P., and Sklad, P. S., in Analytical Electron Microscopy - 1984, edited by Williams, D. B. and Joy, D. C. (San Francisco Press, San Francisco, CA, 1984), pp. 315317.Google Scholar
4. Williams, D. B., Practical Analytical Electron Microscopy in Materials Science (Philips Electronic Instruments, Inc., Mahwah, NJ, 1984).Google Scholar
5. Williams, D. B., Goldstein, J. I., and Fiori, C. E., in Principles of Analytical Electron Microscopy, 2nd ed., edited by Joy, D. C., Romig, A. D. Jr., and Goldstein, J. I. (Plenum Press, New York, 1986).Google Scholar
6. Anderson, I. M., Ph. thesis, D., Cornell University, 1993.Google Scholar
7. Anderson, I. M., Bentley, J., and Carter, C. B., Microbeam Analysis 2, pp. S230–S231 (1993).Google Scholar
8. Anderson, I. M., Bentley, J., and Carter, C. B., in preparation.Google Scholar
9. Muan, A., J. Amer. Ceram. Soc. 75, 13571360 (1992).Google Scholar
10. Spurr, A. R., J. Ultrastr. Res. 26, 3143 (1969).Google Scholar
11. Anderson, I. M., Bentley, J., and Carter, C. B., these proceedings.Google Scholar