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Quantitative Studies of Glow-Discharge Deposition Using Optical Emission Spectroscopy

Published online by Cambridge University Press:  21 February 2011

F. J. Kampas
F. J. Kampas*
Affiliation:
Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY 11973
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Abstract

Intensities of CH optical emission and electrical properties of methane rf discharges as a function of pressure are presented and discussed. The results are consistent with a model in which the properties of the discharge are dominated by secondary electrons traversing the gap between the electrodes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 85
Copyright
Copyright © Materials Research Society 1985

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References

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