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Pulsed Laser Deposition of High Tc Superconducting thin Films: Present and Future

Published online by Cambridge University Press:  16 February 2011

X. D. Wu ,
T. Venkatesan ,
A. Inam ,
X. X. Xi ,
Q. Li ,
W. L. McLean ,
C. C. Chang ,
D. M. Hwang ,
R. Ramesh  and
L. Nazar
...Show all authors
X. D. Wu
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
T. Venkatesan
Affiliation:
Bellcore, Red Bank, NJ 07701
A. Inam
Affiliation:
Physics Department, Rutgers University, Piscataway, NJ 08854
X. X. Xi
Affiliation:
Physics Department, Rutgers University, Piscataway, NJ 08854
Q. Li
Affiliation:
Physics Department, Rutgers University, Piscataway, NJ 08854
W. L. McLean
Affiliation:
Physics Department, Rutgers University, Piscataway, NJ 08854
C. C. Chang
Affiliation:
Bellcore, Red Bank, NJ 07701
D. M. Hwang
Affiliation:
Bellcore, Red Bank, NJ 07701
R. Ramesh
Affiliation:
Bellcore, Red Bank, NJ 07701
L. Nazar
Affiliation:
Bellcore, Red Bank, NJ 07701
B. Wilkens
Affiliation:
Bellcore, Red Bank, NJ 07701
S. A. Schwarz
Affiliation:
Bellcore, Red Bank, NJ 07701
R. T. Ravi
Affiliation:
Bellcore, Red Bank, NJ 07701
J. A. Martinez
Affiliation:
Departamento de Fisica, Universidad Nacional de La Plata (UNLP), Argentina
P. England
Affiliation:
Bellcore, Red Bank, NJ 07701
J. M. Tarascon
Affiliation:
Bellcore, Red Bank, NJ 07701
R. E. Muenchausen
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
S. Foltyn
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
R. C. Estler
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
R. C. Dye
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
A. R. Garcia
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
N. S. Nogar
Affiliation:
ERDC, Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

Pulsed laser deposition (PLD) has been widely used for deposition of high Tc superconducting thin films, and is recognized as one of the best physical vapor techniques for the preparation of these films. The most important advantage of this technique is stoichiometric deposition; films can be made with the same composition as the target. Utilizing PLD, not only thin films but also multilayers and superlattices of high Tc superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and speculations regarding the future would be made.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 191: Symposium N – Laser Ablation for Materials Synthesis , 1990 , 129
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

[1] Cheung, J. T. and Sankur, H., CRC Crit. Rev. Solid State Mater. Sci. 15, 63(1988)Google Scholar
[2] Boyd, I. W., Laser Processing of Thin Films and Microstructures: Oxidation. Deposition and Etching of Insulators, (Springer-Verlag, New York, 1987).Google Scholar
[3] Wu, X.D., PhD Thesis, Rutgers University, 1989.Google Scholar
[4] Geserich, H. P., Koch, B., Scheiber, G., Geerk, J., Li, H. C., Linker, G., Weber, W., and Assmus, W., Physica C 153–155, 661(1988).Google Scholar
[5] Koren, G., Gupta, A., Baseman, R. J., Lutwyche, M. I., and Laibowitz, R. B., App:. Phys. Lett. 55, 2450(1989).Google Scholar
[6] Lyon, L., Weinberger, B. R., Peterson, G. G., and krasinski, H. A., Appl. Phys. Lett. 52, 320(1988).Google Scholar
[7] Wu, M. K., Ashburn, J. R., Torng, C. T., Hor, P. H., Meng, R. L., Gao, L., Huang, Z. L., Wang, Y. Q., and Chu, C. W., Phys. Rev. Lett. 58, 908(1987).Google Scholar
[8] Maeda, H., Tanaka, Y., Fukutumi, M. and Asano, T., Jpn. J. Appl. Phys. 27, L209(1988); J. M. Tarascon, Y. LePage, L. H. Greene, B. G. Bagley, P. Barboux, D. M. Hwang, G. W. Hull, W. R. McKinnon and M. Giroud, Phys. Rev. B38, 2504(1998).Google Scholar
[9] Sheng, Z. Z. and Herman, A. M., Nature 332, 55(1988); 332, 138(1988); S. S. Parkin, V. Y. Lee, E. M. Engler, A. I. Nazzal, T. C. Huang, G. Gorman, R. Savoy and R. Beyers, Phys. Rev. Lett. 60, 2539(1988).Google Scholar
[10] Zaitsev-Zotov, S. V., Martynyuk, A. N., and Protasov, E. A., Sov. Phys. Soild State 25, 100(1983).Google Scholar
[11] Dijkkamp, D., Venkatesan, T., Wu, X. D., Shaheen, S. A., Jisrawi, N., Min-Lee, Y. H., McLean, W. L., and Croft, M., Appl. Phys. Lett. 51, 619(1987).Google Scholar
[12] Venkatesan, T., Wu, X. D., Inam, A., Jeon, Y., Croft, M., Chase, E. W., Chang, C. C., Wachtman, J. B., Odom, R. W., Radicati, F., and Magee, C. A., Appl. Phys. Lett. 53, 1431(1988).Google Scholar
[13] Venkatesan, T., Wu, X. D., Inam, A. and Wachtman, J. B., Appl. Phys. Lett. 52, 1193(1988).Google Scholar
[14] Wu, X. D., Venkatesan, T., Inam, A., Chase, E. W., Chang, C. C., Jeon, Y., Croft, M., Magee, C., Odom, R. W., and Radicati, F., in Proc. SPIE - High Tc Superconductivity: Thin Films and Devices, 948, 50(1988).Google Scholar
[15] Venkatesan, T., Chang, C. C., Dijkkamp, D., Chase, E. W., Hwang, D. M., Schwarz, S. A., Miceli, P. F., Farrow, L. A., Tarascon, J. M., Wu, X. D., and Inam, A., J. Appl. Phys. 63, 4591(1988).Google Scholar
[16] Wu, X. D., Inam, A., Venkatesan, T., Chase, E. W., Barboux, P., Tarascon, J. M. and Wilkens, B., Appl. Phys. lett. 52, 754(1988).Google Scholar
[17] Koren, G., Polturak, E., Fisher, B., Cohen, D. and Kimel, G., Appl. Phys. Lett. 63, 2330(1988); G. Koren, A. Gupta, E. A. Giess, A. Segmuller and R. B. Laibowitz, Appl. Phys. Lett. 54, 754(1988).Google Scholar
[18] Roas, B., Schultz, L. and Endres, G., Appl. Phys. Lett. 53, 1557(1988).Google Scholar
[19] Golovashikin, A. I., Ekimov, E. V., Krasnosvobodtsev, S. I. and Pechen, E. V., Physica C 153–155, 1455(1988).Google Scholar
[20] Frohlingsdrof, J., Zander, W. and Stritzker, B., Soild State Comm. 67, 965(1988).Google Scholar
[21] Venkatesan, T., Wu, X. D., Dutta, B., Inam, A., Hegde, M. S., Hwang, D. M., Nazar, L. and Wilkens, B., Appl. Phys. lett. 54, 581(1989).Google Scholar
[22] Wu, X. D., Dutta, B., Hedge, M. S., Inam, A., Venkatesan, T., Chase, E. W., Chang, C. C., and Howard, R., Appl. Phys. Lett. 54, 179(1989).Google Scholar
[23] Bando, Y., Terashima, T., Iijima, K., Yamamoto, K., Hirata, K. and Mazaki, H., in Proceedings of the Symposium of the Materials Research Society (Tokyo, 1988).Google Scholar
[24] Xi, X. X., Geerk, J., Linker, G., Li, Q., and Meyer, O., Appl. Phys. Lett. 54, 2367(1989).Google Scholar
[25] Inam, A., Wu, X. D., Nazar, L., Hegde, M. S., Rogers, C. T., Venkatesan, T., Simon, R., Daly, K., Padamsee, H., Kirchgessner, J., Moffat, D., Rubin, D., Shi, Q., Kalokitis, D., Fathy, A., Pendrick, V., Brown, R., Brycki, B., Belohoubek, E., Drabeck, L., Gruner, G., Hammond, R., Gamble, F., Lairson, B. and Bravman, J. B., Appl. Phys. Lett. 56, 1178(1989)Google Scholar
[26] Ferrari, M. J., Johnson, M., Wellstood, F. C., Clarke, J., Inam, A., Wu, X. D., Nazar, L. and Venkatesan, T., Nature, 341, 723(1989).Google Scholar
[27] Stoffel, N. D., Morris, P. A., Bonner, W. A., and Wilkens, B. J., Phys. Rev. B37, 2297(1988).Google Scholar
[28] Wu, X. D., Muenchausen, R. E., Foltyn, S., Estler, R. C., Dye, R. C., Flamme, C., Nogar, N. S., Garcia, A. R., Martin, J. and Tesmer, J., Appl. Phys. Lett. 56, 1481(1990)Google Scholar
[29] Wu, X. D., Muenchausen, R. E., Foltyn, S., Estler, R. C., Dye, R. C., Garcia, A. R., Nogar, N. S., England, P., Ramesh, R., Hwang, D. M., Ravi, T. S., Chang, C. C., Venkatesan, T., Xi, X. X., Li, Q. and Inam, A., Appl. Phys. Lett. (Aug. 8, 1990).Google Scholar
[30] Soderholm, L., Zhang, K., Hinks, D. H., Beno, M. A., Jorgensen, J. D., Segre, C. U., and Schuller, I. K., Nature, 328, 604(1987); B. Okai, M. Kosuge, H. Nozaki, K. Takahashi, and M. Ohta, Jpn. J. Appl. Phys. 27, 41(1988); M. Matsuda, K. Kinoshita, T. Ishii, H. Shibada, T. Watanabe and T. Yamada, Phys. Rev. B38, 2910(1988).Google Scholar
[31] Wu, X. D., Hegde, M. S., Xi, X. X., Li, O., Inam, A., Schwarz, S. A., Martinez, J. A., Barner, B. J., Chang, C. C., Nazar, L., Rogers, C. T. and Venkatesan, T., in Proc. of Materials Research Society (Boston, 1989) (in press).Google Scholar
[32] Venkatesan, T., Inam, A., Dutta, B., Ramesh, R., Hegde, M. S., Wu, X. D., Nazar, L., Chang, C. C., Barner, J. B., Hwang, D. M., and Rogers, C. T., Appl. Phys. Lett. 56, 391(1989).Google Scholar
[33] Rogers, C. T., Inam, A., Hegde, M. S., Dutta, B., Wu, X. D., and Venkatesan, T., Appl. Phys. Lett. 55, 2032(1989).Google Scholar
[34] Kanai, M., Kawai, T., Kawai, S. and Tabata, H., Appl. Phys. Lett. 54, 1802(1989).Google Scholar
[35] Triscone, J.-M., Karkut, M. G., Antognazza, L., Brunner, O. and Fischer, O., Phys. Rev. Lett. 55, 2032(1989).Google Scholar
[36] Wu, X. D., Xi, X. X., Li, O., Inam, A., Dutta, B., DiDomenico, L., Weiss, C., Martinez, J. A., Wilkens, B. J., Schwarz, S. A., Barner, J. B., Chang, C. C., Nazar, L., and Venkatesan, T., Appl. Phys. Lett. 56, 400(1989).Google Scholar
[37] Li, Q., Xi, X. X., Wu, X. D., Inam, A., Vadlamannati, S., McLean, W. L., Venkatesan, T., Ramesh, R., Martinez, J. A. and Nazar, L., Phys. Rev. Lett. 25, 3086(1990).Google Scholar
[38] Terashima, T., Iijima, K., Yamamoto, K., Bando, Y. and Mazaki, H., Jpn. J. Appl. Phys. 27, L91(1988).Google Scholar
[39] Berkley, D.D., Johnson, B. R., Anand, N., Beauchamp, K. M., Conroy, L. E., Goldman, A. M., Mauersberger, K., Mecartney, M. L., Norton, J., Tuominen, M. and Zhang, Y-J., Appl. Phys. Lett. 53, 1973(1988).Google Scholar
[40] Witanachchi, S., Kwok, H. S., Wang, X. W., and Shaw, D. T., Appl. Phys. Lett. 53, 234(1988).Google Scholar
[41] Koren, G., Gupta, A., and Baseman, R. J., Appl. Phys. Lett. 54, 1920(1989).Google Scholar
[42] Singh, R. K., Narayan, J., Singh, A. K., and Krishnaswarmy, J., Appl. Phys. Lett. 54, 2271(1989).Google Scholar
[43] Xi, X. X., Li, H. C., Geerk, J., Linker, G., Meyer, O., Obst, B., Ratzel, F., Smithey, R., and Weschenfelder, F., Physica C 153–155, 794(1988).Google Scholar
[44] Sandstrom, R. L., Gallagher, W. J., Dinger, T. R., Koch, R. H., Laibowitz, R. B., Kleinsasser, A. W., Gambino, R. J., Bumble, B. and Chisholm, M. F., Appl. Phys. Lett. 53, 444(1988); C. B. Eom, J. Z. Sun, K. Yamamoto, A. F. Marshall, K. E. Luther, T. H. Geballe, S. S. Laderman, Appl. Phys. Lett. 55, 595(1989).Google Scholar