Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Wu, C.S.
Ren, F.
Pearton, S.J.
Hu, M.
Pao, C.K.
and
Wang, R.F.
1995.
High efficiency microwave power AlGaAs/InGaAs PHEMTs fabricated by dry etch single gate recess.
IEEE Transactions on Electron Devices,
Vol. 42,
Issue. 8,
p.
1419.
Wu, C.S.
Pao, C.K.
Yau, W.
Kanber, H.
Hu, M.
Bar, S.X.
Kurdoghlian, A.
Bardai, Z.
Bosch, D.
Seashore, C.
and
Gawronski, M.
1995.
Pseudomorphic HEMT manufacturing technology for multifunctional Ka-band MMIC applications.
IEEE Transactions on Microwave Theory and Techniques,
Vol. 43,
Issue. 2,
p.
257.
Chou, Y.C.
Li, G.P.
Chen, Y.C.
Wu, C.S.
Yu, K.K.
and
Midford, T.A.
1996.
Off-state breakdown effects on gate leakage current in power pseudomorphic AlGaAs/InGaAs HEMTs.
IEEE Electron Device Letters,
Vol. 17,
Issue. 10,
p.
479.
Brown, J. J.
Pusl, J. A.
M. Hu
Schmitz, A.E.
Docter, D.P.
Shealy, J.B.
Case, M.G.
and
Thompson, M.A.
1996.
High-efficiency GaAs-based pHEMT C-band power amplifier.
IEEE Microwave and Guided Wave Letters,
Vol. 6,
Issue. 2,
p.
91.
Pusl, J.A.
Brown, J.J.
Shealy, J.B.
Hu, M.
Schmitz, A.E.
Docter, D.P.
Case, M.G.
Thompson, M.A.
and
Nguyen, L.D.
1996.
High-efficiency GaAs-based pHEMT power amplifier technology for 1-18 GHz.
Vol. 2,
Issue. ,
p.
693.
Hahn, Y.B
Lee, J.W
Mackenzie, K.D
Johnson, D
Pearton, S.J
and
Ren, F
1998.
Effect of deposition condition on wet and dry etch rates of device quality inductively coupled plasma-chemically vapor deposited SiNx.
Solid-State Electronics,
Vol. 42,
Issue. 11,
p.
2017.
Lee, J.W
MacKenzie, K.D
Johnson, D
Shul, R.J
Pearton, S.J
Abernathy, C.R
and
Ren, F
1998.
Device degradation during low temperature ECR-CVD. PART III: GaAs/InGaP HEMTs.
Solid-State Electronics,
Vol. 42,
Issue. 6,
p.
1027.
Lee, J.W
MacKenzie, K
Johnson, D
Shul, R.J
Pearton, S.J
and
Ren, F
1998.
Low temperature ECR-CVD of SiNX for III-V device passivation.
Solid-State Electronics,
Vol. 42,
Issue. 6,
p.
1031.
Lee, J.
and
Ren, F.
2000.
Handbook of Advanced Plasma Processing Techniques.
p.
575.
Luo, B.
Johnson, J. W.
Ren, F.
Baik, K. H.
and
Pearton, S. J.
2001.
Electrical effects of plasma enhanced chemical vapor deposition of SiNx on GaAs Schottky rectifiers.
Journal of Applied Physics,
Vol. 90,
Issue. 9,
p.
4800.
Luo, B
Baik, K
Ren, F
Pearton, S.J
and
Mackenzie, K.D
2002.
Comparison of the effects of deuterated SiNX films on GaN and GaAs rectifiers.
Solid-State Electronics,
Vol. 46,
Issue. 9,
p.
1453.
Ahlawat, Anil
Pandey, Manoj
and
Pandey, Sujata
2007.
Microwave analysis of a 70 nm InGaAs pHEMT on InP substrate for nanoscale digital IC application.
Microwave and Optical Technology Letters,
Vol. 49,
Issue. 10,
p.
2462.