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Proton NMR Spin-Lattice Relaxation Time Characterization of a-Si(H) Structure
Published online by Cambridge University Press: 15 February 2011
Abstract
NMR data are presented for reactively sputtered amorphous silicon-hydrogen alloys (a-Si(H)). Measured differences in two of the samples are attributed to two distinct morphologies: a mixed phase (monohydride and dihydride) and a purely monohydride composition. Features of the mixed phase morphology have been modeled. Room temperature, 35 MHz spin-lattice relaxation times are presented for a series of monohydride samples prepared with systematically varied sputtering parameters. A correlation of proton T1 with the density of ESR states tentatively is suggested.
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- Copyright © Materials Research Society 1981
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