Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Yang, L.
Chen, L.
and
Catalano, A.
1991.
The Effect of Hydrogen Dilution on the Deposition of Sige Alloys and the Device Stability.
MRS Proceedings,
Vol. 219,
Issue. ,
Nakata, Yukihiko
1993.
Current Topics in Amorphous Materials.
p.
369.
Baldwin, G.
Dalal, V.
and
Han, K.
1993.
Deposition of high quality a-(Si,Ge):H films and novel graded gap devices using RF triode glow discharge deposition.
p.
1037.
Fortmann, C. M.
and
Fischer, D.
1993.
Relationship among mobility, recombination kinetics, and optimized solar cell performance.
Applied Physics Letters,
Vol. 62,
Issue. 24,
p.
3147.
Sanghoon Bae
Jingya Hou
Suntharalingam, V.
and
Fonash, S.J.
1993.
A payback assessment for materials development for the low-gap unit of a multi-junction cell: a numerical modeling study.
p.
1011.
Fortmann, C.M.
1995.
Plasma Deposition of Amorphous Silicon-Based Materials.
p.
131.
Rath, J. K.
Middya, A. R.
and
Ray, Swati
1995.
Influence of deposition parameters on defect formation in a-SiGe:H alloys.
Philosophical Magazine B,
Vol. 71,
Issue. 5,
p.
851.
Kuznetsov, V. I.
Zeman, M.
Vosteen, L. L. A.
Girwar, B. S.
and
Metselaar, J. W.
1996.
Electrical and optical properties of plasma-deposited a-SiGe:H alloys: Role of growth temperature and postgrowth anneal.
Journal of Applied Physics,
Vol. 80,
Issue. 11,
p.
6496.
Sheng, S.R
Sun, G.S
Liebe, J
Kattwinkel, A
Braunstein, R
Nelson, B.P
von Roedern, B
and
Bärner, K
2002.
Electronic properties of hydrogenated amorphous silicon–germanium alloys and long-range potential fluctuations.
Materials Science and Engineering: A,
Vol. 325,
Issue. 1-2,
p.
490.
Sheng, S.R.
Boshta, M.
Braunstein, R.
and
Dalal, V.L.
2002.
On the electronic transport properties of amorphous (Si,Ge) alloys: charged scattering centers and compositional disorder.
Journal of Non-Crystalline Solids,
Vol. 303,
Issue. 2,
p.
201.