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Properties of Silicon Oxynitride and Aluminum Oxynitride Coatings Deposited Using Ion Assisted Deposition

Published online by Cambridge University Press:  25 February 2011

G. A. Al-Jumaily ,
T. A. Mooney ,
W. A. Spurgeon  and
H. M. Dauplaise
G. A. Al-Jumaily
Affiliation:
Barr Associates, 2 Lyberty Way, Westford, MA 01886
T. A. Mooney
Affiliation:
Barr Associates, 2 Lyberty Way, Westford, MA 01886
W. A. Spurgeon
Affiliation:
Army Materials Technology Laboratory, Watertown, MA 02172
H. M. Dauplaise
Affiliation:
Army Materials Technology Laboratory, Watertown, MA 02172
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Abstract

Optical thin films of nitrides, oxynitrides and oxides of aluminum and silicon were deposited using ion assisted deposition. Coatings were deposited by thermal evaporation of AlN and e-beam evaporation of Si with simultaneous bombardment with 300 eV ions of nitrogen, a mixture of nitrogen and oxygen or oxygen. The chemical composition and the index of refraction of the coating was varied by varying the gas mixture in the ion beam. Optical properties of and environmental stability of coatings were examined. Results indicated that coatings are stable even under severe conditions of humidity and temperature.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 61
Copyright
Copyright © Materials Research Society 1989

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References

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