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Properties of Gold Films on Aluminum Alloy Substrates Prepared by Ionized Cluster Beam Deposition Process

Published online by Cambridge University Press:  26 February 2011

Yoichi Hashimoto
Affiliation:
Mitsubishi Electric Corp., Amagasaki, Hyogo, Japan
Yoshitaka Maeyama
Affiliation:
Mitsubishi Electric Corp., Amagasaki, Hyogo, Japan
Kazumichi Machida
Affiliation:
Mitsubishi Electric Corp., Amagasaki, Hyogo, Japan
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Abstract

The deposition of gold film onto aluminum alloy substrate was attempted by the Ionized Cluster Beam(ICB) deposition process. The adhesive strength, reflectivity, and geometrical accuracy(conformance to specifications) were evaluated for the films deposited under various acceleration voltages and substrate temperatures. The film-substrate interface was examined by Auger electron spectroscopy and x-ray diffraction. A gold film with reflectivity of 99.2 % and an adhesive strength of over 4–0 N/mm2 was obtained by ICB deposition at room temperature. It was established that a high adhesive strength can be achieved by ICB deposition even if a surface oxide layer on the substrate remains.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

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References

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