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Properties Of Cosb3 Films Grown by Pulsed Laser Deposition

Published online by Cambridge University Press:  15 February 2011

Hans-Martin Christen
Affiliation:
Neocera, Inc., 10000 Virginia Manor Road, Suite 300, Beltsville, MD 20705–4215
David G. Mandrus
Affiliation:
Oak Ridge National Laboratory, Solid State Division, Oak Ridge, TN 37831
David P. Norton
Affiliation:
Oak Ridge National Laboratory, Solid State Division, Oak Ridge, TN 37831
Lynn A. Boatner
Affiliation:
Oak Ridge National Laboratory, Solid State Division, Oak Ridge, TN 37831
Brian C. Sales
Affiliation:
Oak Ridge National Laboratory, Solid State Division, Oak Ridge, TN 37831
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Abstract

Polycrystalline CoSb3 films were grown on a variety of electrically insulating substrates by pulsed laser ablation from a stoichiometric hot-pressed target. These films are fully crystallized in the skutterudite structure, and the grains exhibit a strongly preferred alignment of the cubic [310]-axis perpendicular to the substrate surface. The film quality is studied for different single-crystal substrates and as a function of growth temperature and background gas.

Hall measurements show that the films are p-type semiconducting with a room-temperature carrier density of 3×1020 holes/cm3. The Hall mobility is found to be 50 to 60 cm2 /Vs, which is high for such a heavily-doped material. The Seebeck coefficient and the resistivity are measured as a function of temperature and are compared to bulk measurements.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

1. Mahan, G., Sales, B., and Sharp, J., Physics Today, March 1997, 42.Google Scholar
2. Sales, B. C., Mandrus, D., Williams, R. K., Science 272 1325 (1996).Google Scholar
3. Anno, H., Matsubara, K., Notohara, Y., Sakakibara, T., Kishimoto, K., and Koyanagi, T., Proc. XV Int. Conf. on Thermoelectrics, Pasadena, CA, March 26–29, 1996.Google Scholar
4. Chrisey, D. B. and Hubler, G. K. (Eds.), Pulsed Laser Deposition of Thin Films (John Wiley & Sons, Inc., New York, 1994).Google Scholar