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Processing Effects on the Contact Resistance of Ion Beam Sputtered Silver on Highly Oriented C-Axis and A-Axis YBCO Films

Published online by Cambridge University Press:  26 February 2011

M. Narbutovskih ,
J. Rosner ,
P. Merchant  and
R. D. Jacowitz
M. Narbutovskih
Affiliation:
Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA.
J. Rosner
Affiliation:
Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA.
P. Merchant
Affiliation:
Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA.
R. D. Jacowitz
Affiliation:
Hewlett-Packard Company, 3500 Deer Creek Road, Palo Alto, CA.
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Abstract

This paper reports on the processes used to achieve low resistance silver contacts to YBCO thin films that have either c-axis or a-axis orientation. Characterization by x-ray diffraction and TEM verified that these films are highly oriented with either the a or the c axis oriented perpendicular to the substrate surface. TEM examination of some of the Ag/YBCO interfaces reveals the presence of an amorphous layer. We will describe the effects of ion beam etching and RTA alloying on the contact resistivity for both orientations.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 275: Symposium S – Layered Superconductors: Fabrication, Properties and Applications , 1992 , 723
Copyright
Copyright © Materials Research Society 1992

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References

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