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Preparation of Y-Ba-Cu-O Superconducting Films by Modified Dc Sputtering Process

Published online by Cambridge University Press:  28 February 2011

R. J. Lin
Affiliation:
Materials Research Laboratories, Industrial Technology Research Institute, 195 Chung-hsing Rd., Sec. 4, Chutung, Hsinchu 31015, Taiwan, Republic of China
Y. C. Chen
Affiliation:
Materials Research Laboratories, Industrial Technology Research Institute, 195 Chung-hsing Rd., Sec. 4, Chutung, Hsinchu 31015, Taiwan, Republic of China
J. H. Kung
Affiliation:
Materials Research Laboratories, Industrial Technology Research Institute, 195 Chung-hsing Rd., Sec. 4, Chutung, Hsinchu 31015, Taiwan, Republic of China
P. T. Wu
Affiliation:
Materials Research Laboratories, Industrial Technology Research Institute, 195 Chung-hsing Rd., Sec. 4, Chutung, Hsinchu 31015, Taiwan, Republic of China
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Abstract

High Tc Y-Ba-Cu-O superconducting thin films have been successfully deposited by DC sputtering techniques with excellent adhesion properties. Onset temperature of 95K had been achieved without any heat treatment nor annealing. Typical deposition rate is 1–2A/sec. It is possible to fabricate the superconducting thin films on a variety of substrates with this techniques, i.e., SiO2, Si and MgO. Analysis indicated that the films were predominantly the orthorhombic perovskite structure with traces of copper oxide.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

1. Bednorz, J. G. and Muller, K. A., Z. Phys., B 64, 189(1986).Google Scholar
2. Chu, C. W., Hor, P. H., Meng, R. L., Gao, L., Huang, Z. J. and Wang, Y. Q., Phys. Rev. Lett., 58, 405(1987).Google Scholar
3. Enomoto, Y., Murakami, T., Suzuki, M. and Moriwak, K., Jpn. J. of Appl. Phys., 26(7), L1248L1250(1987).Google Scholar
4. Nagata, S., Kawasaki, M., Funahashi, M., Fueki, K. and Koinuma, H., Jpn. J. Appl. Phys., 26, L410(1987).Google Scholar
5. Hammond, R. H., Naito, M., Hahn, B. Oh. M., Rosenthal, P., Marshall, A., Missert, N., Beasley, M. R., Kapitulnik, A. and Geballe, T. H., MRS Symposium on High Temperature Superconductors, Anaheim, CA, 1987.Google Scholar
6. Tsaur, B. Y., Dilorio, M. S. and Strauss, A. J., Appl. Phys. Lett., 51 (11), 858860(1987).Google Scholar
7. Thornton, John A., in Deposition Technologies for Films and Coatings, edited by Bunshah, R. F. (Noyes Publications, Park Ridge, 1982)pp. 179.Google Scholar
8. Moorjani, K., Bohandy, J., Adrian, F. J. and Kim, B. F., Phys. Rev. B 6 (7), 4036(1987).Google Scholar