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Preparation of Yba2Cu3O7 - X. Superconducting Thin Films by Means of Single Target Rf-Sputtering+

Published online by Cambridge University Press:  28 February 2011

Herman D.L. Weyten ,
R. De Batist ,
P. Nagels  and
J. Cornelis
Herman D.L. Weyten
Affiliation:
University of Antwerp (UIA), Dept. of Chemistry, Universiteitspleln 1, B‐2610 Wllrijk, Belgium
R. De Batist
Affiliation:
University of Antwerp (RUCA), Middelheimlaiin 1, B‐2020 Antwerp, Belgium
P. Nagels
Affiliation:
University of Antwerp (RUCA), Middelheimlaiin 1, B‐2020 Antwerp, Belgium
J. Cornelis
Affiliation:
S.C.K./C.E.N., Materials Development Dept., Boeretang 200, B‐2400 Mol, Belgium
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Abstract

High Tc superconducting thin films have been deposited on sapphire by means of RF‐sputtering from a single stoichiometric target of YBa2Cu3O7 ‐ x composition. The YBa2Cu3O7 ‐ x films were deposited in an argon‐oxygen atmosphere on a substrate which reached a temperature of s 400°C during deposition. The study of stoichiometry and homogeneity of the as‐deposited films, by means of electromicroprobe analysis (EMPA), was used to optimize the sputtering parameters of the system. To achieve superconductivity, with an onset of s 90 K, a high‐temperature, post‐deposition thermal treatment in oxygen was necessary. Resistivity measurements show that, with respect to the bulk samples, zero resistivity is lowered as a result of substrate interaction. The use of buffer layers can improve the quality of the superconducting thin films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 647
Copyright
Copyright © Materials Research Society 1990

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