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Preparation of Boron Nitride Films by Rf Reactive Sputtering
Published online by Cambridge University Press: 21 February 2011
Abstract
Boron nitride films were deposited by rf reactive sputtering. The composition of the film was determined by X-ray photo-electron spectroscopy(XPS). Optical properties of boron nitride were studied by IR spectroscopy. Resultant films showed optical characteristics similar to those of hexagonal boron nitride. The ratio of boron to nitrogen was varied from 3.11 to 1.45 by varying the amount of nitrogen. Resulting films have refractive index in the range of 2.05 – 3.21.
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- Copyright © Materials Research Society 1992