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Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
Published online by Cambridge University Press: 11 January 2012
Abstract
Al2O3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H2O), and ammonia (NH3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al2O3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al2O3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses.
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 1408: Symposium BB – Functional Nanowires and Nanotubes , 2012 , mrsf11-1408-bb15-05
- Copyright
- Copyright © Materials Research Society 2012