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Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition

Published online by Cambridge University Press:  11 January 2012

Cagla Ozgit
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Fatma Kayaci
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Inci Donmez
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Engin Cagatay
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Tamer Uyar
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
Necmi Biyikli
Affiliation:
UNAM – Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800, Turkey.
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Abstract

Al2O3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H2O), and ammonia (NH3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al2O3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al2O3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

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