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Preferred Orientation and Magnetic Properties of Barium Hexaferrite Thin Films Devitrified from the Glass

Published online by Cambridge University Press:  21 February 2011

Gaurav Agarwal ,
Robert F. Speyer ,
Chung-Kook Lee  and
Geoffrey Spratt
Gaurav Agarwal
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology
Robert F. Speyer
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology
Chung-Kook Lee
Affiliation:
Ssangyong Industrial Co.
Geoffrey Spratt
Affiliation:
Department of Computer and Electrical Engineering, Carnegie-Mellon University
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Abstract

Easy axis orientation of rf magnetron sputtered barium hexaferrite films plays an important role in their usefulness as recording media. Processing variables included substrate temperature, pressure, composition, and duration of sputtering, as well as secondary heat-treatment schedule. As-deposited films were primarily amorphous; after secondary heat-treatment, barium hexaferrite devitrified with a crystal size of ∼200 nm. The c-axis of crystalline grains formed parallel to the heat-treated film surface when the substrate was at 620°C during deposition. A perpendicular c-axis orientation was measured using an argon atmosphere at 1.33 Pa and a substrate temperature of 720°C. This film showed the highest remnance (4.781 × 10-3 emu). The coercivity of such films ranged from 0.8 -2KOe.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 347
Copyright
Copyright © Materials Research Society 1995

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References

[1] Hench, L. L. and West, J. K., Principies of Electronic Ceramics, pp. 321–327, John Wiley and Sons, New York, (1990).Google Scholar
[2] Moulson, A. J. and Herbert, J. M., Electroceramics, pp. 383–386, Chapman and Hall, New York, (1992).Google Scholar
[3] Kittel, C., Rev. Mod. Phys., 21 [4], 541–583 (1949).Google Scholar
[4] Goto, K., Ito, M., and Sakuari, T., Japn. J. Appl. Phys., 19 [7] 1339–1346 (1980).Google Scholar
[5] Cullity, B. D. Introduction to Magnetic Materials, p. 383, Addison Wesley Publishing, New York, (1972).Google Scholar
[6] Iwasaki, S. and Nakamura, Y., IEEE Trans, on Magn., MAG-13, [5], 1272, (1977).Google Scholar
[7] Speliotis, D. E., IEEE Trans. Magn., 23 [5] 3143–3145 (1987).Google Scholar
[8] Fujiwara, T., IEEE Trans. Magn., 21 [5] 1480–1485 (1985).Google Scholar
[9] Matsumoto, M. and Naoe, M., IEEE Trans, on Magn., MAG-21, [5], 1474, (1985).Google Scholar
[10] Morisako, A., Matsumoto, M., and Naoe, M., IEEE Trans, on Magn., MAG-22, 1146, (1986).Google Scholar
[11] Morisako, A., Matsumoto, M., and Naoe, M., IEEE Trans, on Magn., MAG-23, [1] 56–58, (1987).Google Scholar
[12] Thornton, J.A., in Deposition Technologies for Films and Coatings, edited by Bunshah, Rointan F., published by Noyes Publications, 1982.Google Scholar
[13] Duan, S. L., Artman, J.O., Wong, B., and Laughlin, D. E., J. Appl. Phys., 67, 4913 (1990).Google Scholar
[14] Thornton, J. A., pp. 170–243, in Deposition Technologies for Films and Coatings, Bunshah, R. F., ed., Noyes Publications, Park Ridge, NJ (1982).Google Scholar
[15] Lotgering, F. K., J. Inorg. Nucl. Chem., 9, 113–123, (1959).Google Scholar
[16] Masterson, H. J., Lunney, J. G., and Coey, J. M. D., J. Appl. Phys., 73, [8], 3917–21, (1993).Google Scholar
[17] Thornton, J.A., J. Vac. Sci. Technol., 4, [6], 13059–65, (1986).Google Scholar
[18] Fujiwara, T., IEEE Trans. Magn., 23 [5] 3125–3130 (1987).Google Scholar