Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-29T07:27:37.907Z Has data issue: false hasContentIssue false
  • English
  • Français

Positive-Tone Polymer Images by Surface Modification in Ion Beam Exposures

Published online by Cambridge University Press:  25 February 2011

Hiroyuki Hiraoka
Hiroyuki Hiraoka*
Affiliation:
IBM Research Laboratory, San Jose, CA 95193
Get access

Abstract

Under exposures of high energy radiation in vacuum, decarboxylation takes place efficiently on polymer surfaces having carboxylic acid groups. Low energy electron and ion beams are particularly efficient in these chemical reactions on the surfaces because their energy deposition is limited to very shallow depths. The surface areas exposed to the radiation have properties similar to hydrocarbons after decarboxylation, resulting in non-reactions in gas phase silylation, while unexposed areas undergo silylation readily due to the presence of reactive acid groups. The non-silylated areas etch faster in oxygen reactive ion etchings, giving rise to positive tone polymer images. Polymers like poly(methacrylic acid), poly(acrylic acid), and their copolymers have been used. Other polymers like poly(styrene), poly(chloromethylstyrene), and Novolac resins can also be used, because these polymers readily undergo photo-oxidation under uv-irradiation in air, generating carboxylic acid groups on their surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 45: Symposium A – Ion Beam Processes in Advanced Electronic Materials and Device Technology , 1985 , 197
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Rensch, B., Selinger, R. L., Csanky, G., Olney, R. D., and Stover, H. L., J. Vac. Sci. Technol., 16, 1879 (1979).Google Scholar
2. Hiraoka, H., J. Electrochem. Soc., 131, 2938 (1984).Google Scholar
3. Ranby, B. and Rabek, J. F., Photodegradation, Photo-oxidation, and Photostabilization of Polymers, John Wiley & Sons, New York, p169, 1975.Google Scholar
4. Hiraoka, H., in Materials for Microlithography, edited by Thompson, L. F., Willson, C. G., and Frechet, J. M. J., ACS Symposium Sers. 266, page 339, 1984.Google Scholar
5. Hiraoka, H., IBM J. Res. & Develop., 21, 121 (1977).Google Scholar
6. Taylor, G. N., Stillwagon, L. E., and Venkatesan, T., J. Electrochem. Soc., 131, 1658 (1984).CrossRefGoogle Scholar
7. Hiraoka, H. and Pacansky, J., J. Electrochem. Soc., 128, 2645 (1981).Google Scholar
8. Bhlen, H., Greschner, J., Keyser, J., Kulcke, W., and Nehmitz, P., IBM J. Res. & Develp., 16, 568 (1982).Google Scholar
9. Adesida, I., Chinn, J. D., Rathbun, L., and Wolf, E. D., J. Vac. Sci. Technol., 21, 666 (1982).Google Scholar
10.A Japan Synthetic Rubber Co. 's product.Google Scholar