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Polymeric Strip Waveguides and their Connection to Very Thin Ultrafast Metal-Semiconductor-Metal Detectors

Published online by Cambridge University Press:  10 February 2011

Ch. Buchal ,
A. Roelofs ,
M. Siegert  and
M. Löken
Ch. Buchal
Affiliation:
Institute for Thin Film Technology (ISI-IT), Research Center Juelich, D-52425 Juelich, Germany, [email protected]
A. Roelofs
Affiliation:
Institute for Thin Film Technology (ISI-IT), Research Center Juelich, D-52425 Juelich, Germany, [email protected]
M. Siegert
Affiliation:
Institute for Thin Film Technology (ISI-IT), Research Center Juelich, D-52425 Juelich, Germany, [email protected]
M. Löken
Affiliation:
Institute for Thin Film Technology (ISI-IT), Research Center Juelich, D-52425 Juelich, Germany, [email protected]
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Abstract

We present data on the fabrication process of optical waveguides from four different polymers, which have been patterned either by standard lithographical masking and reactive ion beam etching (RIE) or by direct lithographical exposure of photosensitive material. Three of the resists were directly photosensitive, they could be exposed and developed. Thereafter they can be cured and remain stable. Waveguide losses of 3.5 dB/cm had to be accepted for the photosensitive materials, while the non-sensitive polymers formed very good guides (0.8 dB/cm), but were more difficult to process. We demonstrate the coupling of the strip waveguides to optical fibers on one side and to very thin metal-semiconductor-metal (MSM) photodetectors at the other side. A beam propagation method computer code has been used to evaluate the best coupling efficiencies between the guides and the detectors, which are ultrafast (3.5 ps FWHM) due to their very thin silicon slab design (Si thickness 400 nm, sandwiched between two Schottky contacts).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 597: Symposium PP – Thin Films for Optical Waveguide Devices & Materials … , 1999 , 97
Copyright
Copyright © Materials Research Society 2000

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References

1. Soref, R. A., Proc. IEEE 81, p. 1687 (1993).Google Scholar
2. Coffa, S. and Tsybeskov, L. (eds.), Silicon-based optoelectronics, MRS-Bulletin 23 (4) (1998).Google Scholar
3. Cunningham, J. E., Coffa, S., Polman, A., and Soref, R. A. (eds.), Materials and devices for siliconbased optoelectronics (Mat. Res. Soc. Symp. Proc., Pittsburgh, PA, 486, 1998).Google Scholar
4. Weiss, B. L., Soref, R. A. (eds.), IEEE J. Selected Topics Quantum Electr. 4 (6), pp. 897–1045 (1998).Google Scholar
5. Buchal, Ch., Löken, M., Siegert, M., Roelofs, A., Kappius, L., and Mantl, S., Ultrafast Si-based MSM Mesa Photodetectors, Proc. E-MRS Spring Meeting, June 1–4, Strasbourg, France, 1999, to be publishedGoogle Scholar
6. Siegert, M., Ldken, M., Glingener, Ch., Buchal, Ch., IEEE J. Selected Topics Quantum Electr. 4 (6), p. 970 (1998).Google Scholar
7. Beckers, L., Schubert, J., Zander, W., Ziesmann, J., Eckau, A., Leinenbach, P., Buchal, Ch. J. Appl. Phys. 83 (6), p. 3305 (1998).Google Scholar
8. Olin Microelectronic Materials GmbH, 80805 Mtinchen, Germany.Google Scholar
9. Amoco Chemicals, Naperville, IL, USA.Google Scholar
10. Dow Europe, CH-8810 Horgon, SwitzerlandGoogle Scholar