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Point Defects Interaction with Extended Defects and Impurities and its Influences on the Si-SiO2 System Properties

Published online by Cambridge University Press:  01 February 2011

D. Kropman
Affiliation:
Maritime Academy, Mustakivi 25,13912 Tallin, Estonia, [email protected]
U. Abru
Affiliation:
Tondi Electronics, Tallinn, Estonia
T. Kärner
Affiliation:
Departement of Physics, University of Tartu, Tartu, Estonia
U. Ugaste
Affiliation:
Departement of Natural Sciences, Tallinn University, Tallin, Estonia
E. Mellikov
Affiliation:
Technical University, Tallinn, Estonia
M. Kauk
Affiliation:
Technical University, Tallinn, Estonia
I. Heinmaa
Affiliation:
Institute of Chemical Physics and Biophysic, Tallinn, Estonia
A. Samoson
Affiliation:
Institute of Chemical Physics and Biophysic, Tallinn, Estonia
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Abstract

The type and density of the point defects that are generated in the Si surface layer during thermal oxidation depend on the oxidation condition: tempertature, cooling rate, oxidation time, impurity content. The interaction between point defects with extended defects and impurities affect the Si-SiO2 interface properties. The influences of point defects may be diminished and the interface properties improved by an appropriate choice of oxidation conditions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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