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Point Defects Interaction with Extended Defects and Impurities and its Influences on the Si-SiO2 System Properties
Published online by Cambridge University Press: 01 February 2011
Abstract
The type and density of the point defects that are generated in the Si surface layer during thermal oxidation depend on the oxidation condition: tempertature, cooling rate, oxidation time, impurity content. The interaction between point defects with extended defects and impurities affect the Si-SiO2 interface properties. The influences of point defects may be diminished and the interface properties improved by an appropriate choice of oxidation conditions.
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- Research Article
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- Copyright © Materials Research Society 2005
References
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