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Plasma Synthesis of Rare Earth Doped Integrated Optical Waveguides

Published online by Cambridge University Press:  21 February 2011

S. Raoux ,
S. Anders ,
K. M. Yu ,
I. C. Ivanov  and
I. G. Brown
S. Raoux
Affiliation:
Lawrence Berkeley Laboratory, MS 53, Berkeley CA 94720 On leave from DGA/DRET, 4 Rue de la porte-d'Issy, F75015 PARIS.
S. Anders
Affiliation:
Lawrence Berkeley Laboratory, MS 53, Berkeley CA 94720
K. M. Yu
Affiliation:
Lawrence Berkeley Laboratory, MS 53, Berkeley CA 94720
I. C. Ivanov
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063.
I. G. Brown
Affiliation:
Lawrence Berkeley Laboratory, MS 53, Berkeley CA 94720
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Abstract

We describe a novel means for the production of optically active planar waveguides. The technique makes use of a low energy plasma deposition. Cathodic-arc-produced metal plasmas are used for the metallic components of the films and gases are added to form compound films. Here we discuss the synthesis of A12-xErxO3 thin films. The erbium concentration (x) can vary from 0 to 100% and the thickness of the film can be from Angstroms to microns. In such material, at high active center concentration (x=l% to 20%), erbium ions give rise to room temperature 1.53μm emission which has minimum loss in silica-based optical fibers. With this technique, multilayer integrated planar waveguide structures can be grown, such as Al2O3/Al2-xErO3/A12O3/Si, for example.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 392: Symposium U – Thin Films for Integrated Optics Applications , 1995 , 241
Copyright
Copyright © Materials Research Society 1995

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