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Piezoresistive Cantilever Optimization and Applications

Published online by Cambridge University Press:  31 January 2011

Joseph C. Doll
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
Sung-Jin Park
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
Nahid Harjee
Affiliation:
[email protected], Stanford University, Electrical Engineering, Stanford, California, United States
Ali J. Rastegar
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
Joseph R. Mallon
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
Bryan C. Petzold
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
Ginel C. Hill
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
A. Alvin Barlian
Affiliation:
[email protected], Halcyon Molecular, Los Altos, California, United States
Beth Pruitt
Affiliation:
[email protected], Stanford University, Mechanical Engineering, Stanford, California, United States
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Abstract

Piezoresistors are commonly used in microsystems for transducing force, displacement, pressure and acceleration. Silicon piezoresistors can be fabricated using ion implantation, diffusion or epitaxy and are widely used for their low cost and electronic readout. However, the design of piezoresistive cantilevers is complicated by coupling between design parameters as well as fabrication and application constraints. Here we discuss analytical models and design optimization for piezoresistive cantilevers, and describe several applications ranging from studying electron movement using scanning gate microscopy to measuring the biomechanics of whole organisms.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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