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Photopatterneable Block Co-Polymers for Laser Interference Lithography

Published online by Cambridge University Press:  11 July 2012

Taiwo R. Alabi ,
Dajun Yuan  and
Suman Das
Taiwo R. Alabi
Affiliation:
Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, U.S.A.
Dajun Yuan
Affiliation:
Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, U.S.A.
Suman Das
Affiliation:
Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, U.S.A.
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Abstract

We report on the laser interference patterning of as-spun block copolymer films on silicon and silicon dioxide substrates. Our process involves the use of a pulsed laser light source of 266 nm wavelength and any type of diblock copolymer as a positive tone photoresist, resulting in the generation of sub-micron domains of different geometries and periodicity. This non-solvent based method is robust, and when combined with the inherent nano-scaled periodicity in block copolymers, can produce hierarchical patterns on substrates with potential use in the electronics and semiconductor industries.

Keywords

x-ray photoelectron spectroscopy (XPS)laser ablationpolymer
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1412: Symposium FF – Mechanical Nanofabrication, Nanopatterning and Nanoassembly , 2012 , mrsf11-1412-ff07-09
Copyright
Copyright © Materials Research Society 2012

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References

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