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Published online by Cambridge University Press: 10 February 2011
The formation of macropore arrays with high aspect ratios by electrochemical etching of n-type silicon in hydrofluoric acid is a well established technique. By using standard photolithograpy the geometry of the array can be controlled with high precision. This enables us to fabricate twodimensional photonic crystals for the infrared regime. The calculated photonic band structure of the crystal corresponds well with the transmission observed experimentally. Furthermore first defect structures like waveguides and cavities have been realized.