Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-19T04:24:43.145Z Has data issue: false hasContentIssue false

Photoluminescence Detection of Shallow Impurity Neutralization in Iii-V Compound Semiconductors

Published online by Cambridge University Press:  26 February 2011

Jörg Weber
Affiliation:
Max-Planck-Institut f. Festörperforschung, 7000 Stuttgart 80, Federal Republic of Germany
Mandeep Singh
Affiliation:
Max-Planck-Institut f. Festörperforschung, 7000 Stuttgart 80, Federal Republic of Germany
Get access

Abstract

We studied the low-temperature photoluminescence (PL) of several III–V compound semiconductors before and after hydrogen-plasma treatment. Drastic intensity changes of the bound exciton luminescence after hydrogen plasma treatments indicate a neutralization of impurities by the atomic hydrogen. In GaP, neutralization of the sulfur donor as well as the acceptors (C, Zn, Cd) is observed. The intense luminescence of the exciton bound to isoelectronic N in GaP is fully quenched by hydrogen plasma treatment.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Pearton, S.J., Corbett, J.W., and Shi, T.S., Appl.Phys.A 43, 153 (1987)Google Scholar
2.Thewalt, M.L.W., Lightowlers, E.C., and Pankove, J.I., Appl.Phys.Lett. 46, 689 (1985)Google Scholar
3.Weber, J., Pearton, S.J., and Dautremont-Smith, W.C., Appl.Phys.Lett. 49, 1181 (1986)Google Scholar
4.Weber, J., Bantien, F., Pearton, S.J. and Dautremont-Smith, W.C., Defects in Semiconductors, edited by von Bardeleben, H.J. (Material Science Forum vol.10–12, 1986) p. 579Google Scholar
5.Dean, P.J., Faulkner, R.A., Kimura, S., and Ilegems, M., Phys.Rev. B4, 1926 (1971)Google Scholar
6.Pankove, J.I., Zanzucchi, P.J., Magee, C.W., and Lucovsky, G., Appl.Phys.Lett. 46, 421 (1985)Google Scholar
7.Clerjaud, B., Côte, D., and Naud, C., Phys.Rev.Lett. 58, 1755 (1987)Google Scholar
8.Jalil, A., Chevallier, J., Pesant, J.C., Mostefaoui, R., Pajot, B., Murawala, P., Azoulay, R., Appl.Phys.Lett. 50, 439 (1987)Google Scholar
9.Jaros, M. and Brand, S., J.Phys.C: Solid St.Phys. 12, 525 (1979)Google Scholar