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Photo-induced Deposition of Nanostructured Thin Films by UV-exposure of Heteroleptic Ti-alkoxide Solutions

Published online by Cambridge University Press:  01 February 2011

J. David Musgraves ,
B.G. Potter Jr.  and
Timothy J. Boyle
J. David Musgraves
Affiliation:
[email protected], University of Arizona, Department of Materials Science and Engineering, Arizona Materials Laboratory, 4715 E. Fort Lowell Rd., Tucson, AZ, 85712, United States
B.G. Potter Jr.
Affiliation:
[email protected], University of Arizona, Department of Materials Science and Engineering, Tucson, AZ, 85712, United States
Timothy J. Boyle
Affiliation:
[email protected], Sandia National Laboratories, Advanced Materials Laboratory, Albuquerque, NM, 87185, United States
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Abstract

Photodeposited physical relief structures have been formed via the UV-irradiation of solutions of the heteroleptic titanium alkoxide, (OPy)2Ti(TAP)2. Raman studies of the films produced confirm the photoinitiation of hydrolysis and condensation reactions in the molecular structure, leading to the development of an insoluble solid phase. Using a shadow mask technique, these films were deposited directly from solution with microscale patterning and their structure and properties were studied as a function of both irradiation conditions (UV-fluence and intensity) as well as precursor solution chemistry (water content). Variations in nanostructure are visible in scanning electron micrographs, with a higher solution water content producing a more condensed, i.e. less porous, film.

Keywords

nanostructuresol-geloptical
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1074: Symposium I – Synthesis and Metrology of Nanoscale Oxides and Thin Films , 2008 , 1074-I03-13
Copyright
Copyright © Materials Research Society 2008

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References

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