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A Photoemission Study of the Epitaxial Growth of Si on Gap(110)
Published online by Cambridge University Press: 25 February 2011
Abstract
We have used angular resolved ultraviolet photoemission spectroscopy to study the epitaxial growth of Si on GaP(110). Surface state emission obscures the top of the valence band (TVB). The Fermi level for the clean GaP(110) surface is 1.20±0.05eV above the TVB. 1ML (monolayer) of Si pins the Fermi level position at 1.40±0.05eV above the TVB. Further deposition of Si leads to a valence band discontinuity ΔEv=1.07 ±0.10eV.
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- Copyright © Materials Research Society 1987