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Photoelectrochemical Deposition of Metal Patterns on Semiconductors
Published online by Cambridge University Press: 15 February 2011
Abstract
Microscopic metal patterns may be produced on p-type semiconductors using a maskless photoelectrochemical procedure in which electroplating is induced by minority carriers in illuminated portions of a semiconductor electrode. Resolution exceeding l0μ has been achieved for deposits of Au on p-GaAs and Cu on p-Si. “Electroless” imaging and negative photoelectrochemical imaging are also discussed.
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- Copyright © Materials Research Society 1983
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