Hostname: page-component-586b7cd67f-rcrh6 Total loading time: 0 Render date: 2024-11-29T07:36:17.405Z Has data issue: false hasContentIssue false

Photoconductivity in Vacuum Deposited Films of Silicon-Based Polymers

Published online by Cambridge University Press:  15 February 2011

H. Okumoto
Affiliation:
Department of Polymer Physics, National Institute of Materials and Chemical Research, Tsukuba, Ibaraki 305, Japan
M. Shimomura
Affiliation:
Department of Polymer Physics, National Institute of Materials and Chemical Research, Tsukuba, Ibaraki 305, Japan
N. Minami
Affiliation:
Department of Polymer Physics, National Institute of Materials and Chemical Research, Tsukuba, Ibaraki 305, Japan
Y. Tanabe
Affiliation:
Department of Polymer Physics, National Institute of Materials and Chemical Research, Tsukuba, Ibaraki 305, Japan
Get access

Abstract

Silicon-based polymers with σconjugated electrons have specific properties; photoreactivity for microlithography and photoconductivity for hole transport materials. To explore the possibility of combining these two properties to develop photoresists with electronic transport capability, photoconductivity of polysilanes is investigated in connection with their photoinduced chemical modification. Increase in photocurrent is observed accompanying photoreaction of poly(dimethylsilane) vacuum deposited films. This increase is found to be greatly enhanced in oxygen atmosphere. Such changes of photocurrent can be explained by charge transfer to electron acceptors from Si dangling bonds postulated to be formed during photoreaction.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] IIITrefonas, P., West, R., Miller, R. D., and Hofer, D., J. Polym. Sci., Polym. Lett. Ed. 21, 823 (1983).Google Scholar
[2] Zeigler, J. M., Harrah, L. A., and Johnson, A. W., Proc. SPIE 539, 166 (1985).Google Scholar
[3] Miller, R. D., in Silicon-Based Polymer Science, edited by Zeigler, J. M. and Fearon, F. W. G. (American Chemical Society, Washington, DC, 1990), pp. 413458.Google Scholar
[4] Kepler, R. G., Zeigler, J. M., Harrah, L. A., and Kurtz, S. R., Phys. Rev. B 35, 2818 (1987).Google Scholar
[5] Abkowitz, M. A., Rice, M. J., and Stolka, M., Phil. Mag.B 61, 25 (1990).Google Scholar
[6] Kido, J., Nagai, K., Okamoto, Y., and Skotheim, T., App. Phys. Lett. 59, 2760 (1991).Google Scholar
[7] Fujii, A. et al., Jpn. J. Appl. Phys. 34, L1365 (1995).Google Scholar
[8] Kabeta, K., Wakamatsu, S., Sugi, S., and Imai, T., Synth. Met., submitted.Google Scholar
[9] Shimomura, M. et al., Macromolecules 27, 7006 (1994).Google Scholar
[10] Kazaoui, S., Ross, R., and Minami, N., Solid State Communications 90, 623 (1994).Google Scholar
[11] Hasegawa, T. et al., Phys. Rev. Lett. 69, 668 (1992).Google Scholar
[12] Kepler, R. G. and Soos, Z. G., Phys. Rev. B 43, 12530 (1991).Google Scholar
[13] Shimakawa, K., Okada, T., and Imagawa, O., Appl. Phys. Lett. 59, 1078 (1991).Google Scholar
[14] Takeda, K. et al., Phys. Rev. B 50, 5171 (1994).Google Scholar
[15] Naito, H., Zhang, S., Okuda, M., and Dohmaru, T., J. Appl. Phys. 76, 3612 (1994).Google Scholar
[16] Wang, Y., West, R., and Yuan, C.-H., J. Am. Chem. Soc. 115, 3844 (1993).Google Scholar
[17] Kepler, R. G. and Cahall, P. A., Phys. Rev. B 63, 1552 (1993).Google Scholar