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Phase Composition and Microstructure as a Function of Deposition Conditions for Potassium Tantalate Niobate Thin Films Grown by Pulsed Laser Deposition

Published online by Cambridge University Press:  01 January 1992

C.M. Cotell  and
R.E. Leuchtner
C.M. Cotell
Affiliation:
Surface Modification Branch, Naval Research Laboratory, Washington, D.C. 20375
R.E. Leuchtner
Affiliation:
ONT/NRL Post-Doctoral Research Associate; present address: Department of Physics, University of New Hampshire, Durham, NH 03824
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Abstract

Potassium tantalate niobate [K(Ta1−x Nbx )O3 or KTNJ films were deposited by pulsed laser deposition (PLD) on (100)MgO substrates from targets of KTN with x=0.45. The effects of substrate temperature (300–700°C) and ambient oxygen pressure (50 and 300 mTorr) on the characteristics of films were investigated. At 500°C and 300 mTorr, films were amorphous with a few isolated, randomly-oriented crystalline grains of perovskite and pyrochlore. At 600°C and 300 mTorr, the films comprised a columnar microstructure consisting of a mixture of amorphous phase with (100) perovskite. At 650°C, films were almost entirely (100) perovskite. At 700°C, the films were predominantly (100) perovskite, but contained a much higher fraction of pyrochlore. At 50 mTorr, pyrochlore was found in significant fractions up to 650°C. At 700°C, films were predominantly (100) perovskite. Rutherford Backscattering analysis of the chemical composition showed that all the films were potassium-deficient and the tantalum to niobimn ratio exceeded that found in the targets for all deposition conditions. There appeared to be a relationship between oxygen pressure during deposition and the amount of potassium retained in the films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 367
Copyright
Copyright © Materials Research Society 1993

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References

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