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P-Glass Reflow with a Tunable CO2 Laser

Published online by Cambridge University Press:  15 February 2011

P. Jeuch ,
J.P. Joly  and
J.M. Hode
P. Jeuch
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
J.P. Joly
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
J.M. Hode
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
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Abstract

Phosphosilicate glass reflow to improve step coverage of metallizations in integrated circuits is usualy made by a high temperature heat treatment. A new technique is proposed to achieve this annealing by a transient localized heating with a tunable CW CO2 laser. A selective coupling of the laser power is obtained by choosing a 9.25 μm wavelength which matches the Si-O absorption band at 1100 cm−1. Focusing and scanning the laser beam makes the P-glass flow without excessive substrate heating.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 4: Symposium A – Laser and Electron-Beam Interactions with Solids , 1981 , 603
Copyright
Copyright © Materials Research Society 1982

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References

REFERENCES

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