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Peak/Plateau Strength in Nanoscale Multilayer Thin Films: Constrained vs Unconstrained Dislocation Nucleation

Published online by Cambridge University Press:  31 January 2011

Qizhen Li  and
Peter M. Anderson
Qizhen Li
Affiliation:
[email protected], University of Nevada, Reno, Chemical and Metallurgical Engineering, Reno, Nevada, United States
Peter M. Anderson
Affiliation:
[email protected], The Ohio State University, Materials Science and Engineering, Columbus, Ohio, United States
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Abstract

The peak/plateau strength of multilayer thin films is analyzed in terms of the stress to bow out a dislocation loop from an interface. Comparison of approximate analytic models to experimental data suggests that the bow out is “constrained” by nearby interfaces, at least for e-NbN/Mo and e-Ni/Cu films. Estimates of the interfacial pinning distance to form the bow out are ˜20b for e-NbN/Mo and ˜70b for e-Ni/Cu around peak/plateau strength (b is the magnitude of Burgers vector).

Keywords

nanoscalestrengththin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1177: Symposium Z – Computational Nanoscience–How to Exploit Synergy between Predictive Simulations and Experiment , 2009 , 1177-Z09-34
Copyright
Copyright © Materials Research Society 2009

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