Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-29T07:46:52.712Z Has data issue: false hasContentIssue false
  • English
  • Français

PbTiO3 and PbZrxTi1-zO3 Films:Microstructure and Properties

Published online by Cambridge University Press:  15 February 2011

A. E. M. De Veirman ,
J. F. M. Cillessen ,
M. De Keijser ,
R. M. Wolf ,
D. J. Taylor ,
A. A. Staals  and
G. J. M. Dormans
A. E. M. De Veirman
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
J. F. M. Cillessen
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
M. De Keijser
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
R. M. Wolf
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
D. J. Taylor
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
A. A. Staals
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
G. J. M. Dormans
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
Get access

Abstract

Hetero-epitaxial PbTiO3 films have been grown on different oxidic substrates. The orientation (the c or a axis being perpendicular to the substrate surface) and the morphology of the PbTiO3 film have been studied with transmission electron microscopy and X-ray diffraction. For non-volatile memory applications ferroelectric capacitors consisting of PbZrxTi1-xO3 films and Pt electrodes are most commonly used. The microstructure of PbZrxTi1-xO3 films (x=0.36 and x=0.71) grown on oxidized silicon provided with a Ti/Pt electrode, will be discussed in relation to the ferrroelectric properties. Finally, the use of La0.5Sr0.5CoO3 as an oxidic electrode is considered.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 341: Symposium F – Epitaxial Oxide Thin Films and Heterostructures , 1994 , 329
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Venkatesan, T., Thin Solid Films 216, 52 (1992)Google Scholar
2. Larsen, P.K., Cuppens, R. and Spierings, G.A.C.M., Ferroelectrics 128, 265 (1992)Google Scholar
3. Roy, R.A., Etzold, K.F. and Cuomo, J.J. in Ferroelectric Thin Films edited by Myers, E.R. and Kingon, A.I. (Mat. Res. Soc. Symp. Proc. 200, Pittsburgh, PA, 1990) pp. 141–152 Google Scholar
4. de Keijser, M., van Veldhoven, P.J. and Dormans, G.J.M. in Ferroelectric Thin Films III, edited by Myers, E.R., Tuttle, B.A., Desu, S.B. and Larsen, P.K. (Mat. Res. Soc. Symp. Proc. 310, Pittsburgh, PA, 1993) pp. 223–234 Google Scholar
5. De Veirman, A.E.M., Timmers, J., Hakkens, F.J.G., Cillessen, J.F.M. and Wolf, R.M., Philips J. Res. 47, 185 (1993)Google Scholar
6. Cillessen, J.F.M., Wolf, R.M. and De Veirman, A.E.M., Applied Surface Science 69, 212 (1992)Google Scholar
7. Dormans, G.J.M., van Veldhoven, P.J. and de Keijser, M., J. Crystal Growth 123, 537 (1992)Google Scholar
8. Dormans, G.J.M., Keijser, M. de and Veldhoven, P.J.van in Ferroelectric Thin Films II, edited by Kingon, A.I., Myers, E.R. and Tuttle, B.A. (Mat. Res. Soc. Symp. 243, Pittsburgh, PA, 1992) pp. 203–212 Google Scholar
9. Jona, F. and Shirane, G., Ferroelectric Crystals (Pergamon Press, Oxford, 1962)Google Scholar
10. lijima, K., Tomita, Y., Takayama, R. and Ueda, I., J. Appl. Phys. 60, 361 (1986)Google Scholar
11. Erbil, A., Braun, W., Kwak, B.S., Wilkens, B.J., Boatner, L.A. and Budai, J.D., J. Crystal Growth 124, 684 (1992)Google Scholar
12. Matsubara, S., Miura, S., Miyasaka, Y. and Shobata, N., J. Appl. Phys. 66, 5826 (1989)Google Scholar
13. Ogawa, T., Senda, A. and Kasanami, T., Jap. J. Appl. Phys. 30, 2145 (1991)Google Scholar
14. Tabata, H., Kawai, T., Kawai, S., Murata, O., Fujioka, J. and Minakata, S-i. in Heteroepitaxy of Dissimilar Materials, edited by Farrow, R.F.C., Harrison, J.P., Peercy, P.S. and Zangwill, A. (Mat. Res. Soc. Symp. 221, Pittsburgh, PA, 1991) pp. 41–46 Google Scholar
15. de Keijser, M., Dormans, G.J.M., van Veldhoven, P.J., Cillessen, J.F.M. and de Leeuw, D.M., Appl. Phys. Lett. 59, 3556 (1991)Google Scholar
16. Gao, Y., Bai, G., Merkle, K.L., Chang, H.L.M. and Lam, D.J., Thin Solid Films 235, 86 (1993)Google Scholar
17. Bai, G.R., Chang, H.L.M., Foster, C.M., Chen, Z. and Lam, D.J., J. Mater. Res. 9, 156 (1994)Google Scholar
18. de Keijser, M.,et al. to be publishedGoogle Scholar
19. Dormans, G.J.M., de Keijser, M.S., van Veldhoven, P.J. and De Veirman, A.E.M., proceedings of the 5th European Workshop MOVPE and related growth techniques, Malmö, Sweden (1993)Google Scholar
20. de Keijser, M., Dormans, G.J.M., Cillessen, J.F.M., de Leeuw, D.M., and Zandbergen, H.W., Appl. Phys. Lett. 58, 2636 (1991)Google Scholar
21. Spierings, G.A.C.M., van Zon, J.B.A., Klee, M. and Larsen, P.K., Integrated Ferroelectrics 3, 283 (1993)Google Scholar
22. Taylor, D.J., Dormans, G.J.M., Larsen, P.K. and De Veirman, A.E.M., to be submitted for Integrated Ferroelectrics (1994)Google Scholar
23. Fatuzzo, E. and Merz, W.J., Ferroelectricity (North-Holland Publishing Company, Amsterdam, 1967), pp. 211–213 Google Scholar
24. Larsen, P.K., Kampschder, G.L.M., van der Mark, M.B. and Klee, M., Proc. 8th Int. Symp. Appl. Ferroelectrics, Greenville, SC, p. 1 (1992)Google Scholar
25. Taylor, D.J., Larsen, P.K. and Cuppens, R., Appl. Phys. Lett. 64, # (1994)Google Scholar
26. Bernstein, S.D., Wong, T.Y., Kisler, Y. and Tustison, R.W., J. Mat. Res. 8, 12 (1993)Google Scholar
27. Ramesh, R., Inam, A., Chan, W.K., Tillerot, F., Wilkens, B., Chang, C.C., Sands, T., Tarascon, J.M. and Keramidas, V.G., Appl. Phys. Lett. 59, 3542 (1991)CrossRefGoogle Scholar
28. Lee, J., Johnson, L., Safari, A., Ramesh, R., Sands, T., Gilchrist, H. and Keramidas, V.G., Appl. Phys. Lett. 63, 27 (1993)CrossRefGoogle Scholar
29. Eom, C.B., van Dover, R.B., Phillips, J.M., Werder, D.J., Marshall, J.H., Chen, C.H., Cava, R.J., Fleming, R.M. and Fork, D.K., Appl. Phys. Lett. 63, 2570 (1993)Google Scholar
30. Wolf, R.M. and Cillessen, J.F.M., presented at the 1991 MRS Fall Meeting, Boston, NJ, 1991 (unpublished)Google Scholar
31. Larsen, P.K., Dormans, G.J.M., Taylor, D.J. and van Veldhoven, P.J., submitted to J. Appl. Phys. (1994)Google Scholar