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Pb Induced Layer-by-Layer Growth and the Dependence on an Amount of Surfactant in the Growth of Ni on Ni(100) Surface

Published online by Cambridge University Press:  10 February 2011

M. Iwanami
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22-1 Roppongi, Minato-ku, Tokyo 106, JAPAN
M. Kamiko
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22-1 Roppongi, Minato-ku, Tokyo 106, JAPAN
T. Matsumoto
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22-1 Roppongi, Minato-ku, Tokyo 106, JAPAN
R. Yamamoto
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22-1 Roppongi, Minato-ku, Tokyo 106, JAPAN
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Abstract

Surfactant epitaxy has been expected to be a powerful method to improve thin film growth from three dimensional island mode to layer-by-layer growth one. Supposing that Pb is the surfactant and Ni is the substrate and deposition metal, we have investigated how the surfactant atoms segregate on surface by computer simulations using the modified embedded atom method. To verify the effect of Pb on the homoepitaxial growth of Ni, we have performed a series of experiments on the growth of Ni on Ni(100) surface with and without Pb using reflection high energy electron diffraction (RHEED). It was clearly found that Pb induced layer-by-layer growth of Ni metal film. The result of the dependence of the growth behavior on the thickness of Pb layer suggests that there is the most suitable thickness of a surfactant layer which is not always the monolayer.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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