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Parameters Affecting Light-Induced Excess Conductivity in Amorphous Silicon Doping-Modulated Multilayers

Published online by Cambridge University Press:  28 February 2011

F.-C. Su
Affiliation:
Materials Science Engineering Department, State University of New York at Stony Brook, Stony Brook, NY 11794
S. Levine
Affiliation:
Materials Science Engineering Department, State University of New York at Stony Brook, Stony Brook, NY 11794
P. E. Vanier
Affiliation:
Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY 11973
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Abstract

The phenomenon of light-induced excess conductivity (LEC) which occurs in a-Si:H npnp doping-modulated multilayers is found experimentally to be dependent on several different factors. The concentrations of the dopants in n-type and p-type layers affect the Fermi level position, the height of the barriers, and also the density of defects. These parameters are altered by different choices of inert gas diluent (Ar or He) and substrate temperature T. For a given set of deposition conditions, the LEC effect can be maximized by varying the layer thickness. With undiluted silane at T = 250 °C, the effect was relatively small, reaching a maximum in relatively thick layers (540 Å). The largest effects were obtained for films deposited from silane diluted in helium, using thinner (330 Å) layers. However, for films deposited from silane diluted in argon, thS magnitude of the effect and optimum layer thickness was intermediate (440 Å). When Ts was varied, a minimum in LEC was found near 200–250° C. The influence of Sinternal field was examined by using nini, pipi and npnp multilayers. The internal field is a necessary factor to observe a large LEC effect. A compensated film shows a small LEC effect.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

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References

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