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Oxide Film Formation on Metals and Alloys by Thermal, Electrochemical and Plasma Oxidation and Prediction of Resulting Structures

Published online by Cambridge University Press:  10 February 2011

D. L. Cocke ,
S. Promreuk ,
R. Schennach ,
M. Y. Mollah  and
D. G. Naugle
D. L. Cocke
Affiliation:
Department of Chemistry, Lamar University, Beaumont, TX 77710, [email protected]
S. Promreuk
Affiliation:
Department of Chemistry, Lamar University, Beaumont, TX 77710, [email protected] Department of Physics, Texas A&M University, College Station, TX 77840
R. Schennach
Affiliation:
Department of Chemistry, Lamar University, Beaumont, TX 77710, [email protected] Department of Physics, Texas A&M University, College Station, TX 77840
M. Y. Mollah
Affiliation:
Department of Chemistry, Lamar University, Beaumont, TX 77710, [email protected]
D. G. Naugle
Affiliation:
Department of Physics, Texas A&M University, College Station, TX 77840
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Abstract

Multicomponent oxide films are needed to meet the increasing demands of the electronics industry. Three main methods that involve oxidation of a metallic substrate are thermal, anodic and plasma oxidation. Today we do not have an adequate fundamental physical-chemical model of how multicomponent oxides evolve on alloys under these oxidizing conditions to design a wide range of materials for electronic devices. The three methods will be discussed in terms of physical/chemical parameters that influence the chemical nature and structure of the resulting oxides. By using surface studies of the oxidation behavior of numerous metals and alloys we have been able to delineate the factors which are most important to the oxide formation process and provide insight into the prediction of oxide layer structures. The electrochemical processes that occur during the materials reaction with a chosen environment will be used to discuss the physical and chemical mechanisms involved. Intrinsic and extrinsic electric fields will be shown to influence the chemical and structural nature of the resulting oxide structures. Examples will be presented from a number of metal and alloy systems that have been examined in our laboratory. These include Al, Ti, Zr, Nb, Mn, Cu and Ni and some of their selected alloys. The models that have developed from these studies are providing some predictive power in how the complex oxide overlayer will be chemically speciated and on its structure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 574: Symposia BB – Multicomponent Oxide Films for Electronics , 1999 , 125
Copyright
Copyright © Materials Research Society 1999

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References

1. Fehlner, F. P., Low-Temperature Oxidation, John Wiley, New York, 1986.Google Scholar
2. Atkinson, A., Rev. Mod. Phys. 57, p. 437 (1985).10.1103/RevModPhys.57.437Google Scholar
3. Yoon, C. H. and Cocke, D. L., J. Noncrystalline Solids 79, p. 217 (1986).10.1016/0022-3093(86)90224-3Google Scholar
4. Bailey, J. M. and Ritchie, I. M., Oxid. Metals 30, p. 405 & 419 (1988).10.1007/BF00659008Google Scholar
5. Cocke, D. L., Dorris, K., Naugle, D. G and Hess, T. R., Mat. Res. Soc. Proc. 355, p. 421 (1995).10.1557/PROC-355-421Google Scholar
6. Yoon, C. and Cocke, D. L., Appl. Surf. Sci. 31, p. 118 (1988).10.1016/0169-4332(88)90027-XGoogle Scholar
7. Mencer, D., Cocke, D. L. and Yoon, C., Surf. and Interfac. Anal. 17, p. 31 (1991).10.1002/sia.740170109Google Scholar
8. Cocke, D. L., Owens, M. S. and Wright, R. B., Appl. Surf. Sci. 31, p, 341 (1988).10.1016/0169-4332(88)90098-0Google Scholar
9. Cocke, D. L. and Owens, M. S., Appl. Surf. Sci. 31, p. 471 (1988).10.1016/0169-4332(88)90009-8Google Scholar
10. Cocke, D. L., Liang, G., Halverson, D. E. and Naugle, D. G., Mater. Sci. Eng. 99, p. 497 (1988).10.1016/0025-5416(88)90384-9Google Scholar
11. Cocke, D. L., Owens, M. S. and Wright, R. B., Langmuir 4, p. 1311 (1988).10.1021/la00084a019Google Scholar
12. Cocke, D. L. and Owens, M. S., Colloid, J. and Interf. Sci. 19, p. 166 (1989).10.1016/0021-9797(89)90155-0Google Scholar
13. Cocke, D. L., Hess, T. R., Mencer, D. E., Mebrahtu, T. and Naugle, D. G., Solid State Ionics 43, p. 119 (1990).10.1016/0167-2738(90)90478-AGoogle Scholar
14. Mencer, D. E., Hess, T. R., Mebrahtu, T., Cocke, D. L. and Naugle, D. G., J. Vac. Sci. Tech. A9, p. 1610 (1991).10.1116/1.577669Google Scholar
15. Cocke, D. L., Hess, T. R., Mencer, D. E., and Naugle, D. G., in the Proceedings of the 183rd Meeting of the Electrochemical Society, May 1993, Honolulu, Hawaii.Google Scholar
16. West, R. C., ed. CRC Handbook of Chemistry and Physics, 63rd edition, CRC Press Inc., Boca Raton, 1982 Google Scholar
17. Cox, B. in Oxidation of Zirconium and its Alloys, Avaances in Corrosion Science and Technology, eds. Fontana, M. G. and Staehle, R. W., 5, Plenum, New York, 1976, pp. 173–.Google Scholar
18. Cox, B. J. Nucl. Mater. 218, (1995), 261.10.1016/0022-3115(94)00654-7Google Scholar