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The Oxidation Stability of Boron Nitride Thin Films on MgO and TiO2 Substrates

Published online by Cambridge University Press:  15 February 2011

Xiaomei Qiu ,
Abhaya K. Datye ,
Robert T. Paine  and
Lawrence. F. Allard
Xiaomei Qiu
Affiliation:
Center for Microengineered Ceramics and Departments of Chemical and Nuclear Engineering and University of New Mexico, Albuquerque, NM 87131.
Abhaya K. Datye
Affiliation:
Center for Microengineered Ceramics and Departments of Chemical and Nuclear Engineering and University of New Mexico, Albuquerque, NM 87131.
Robert T. Paine
Affiliation:
Chemistry, University of New Mexico, Albuquerque, NM 87131.
Lawrence. F. Allard
Affiliation:
High Temperature Materials Laboratory, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
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Abstract

The stability of BN thin film coatings (2–5 nm thick) on MgO and TiO2 substrates was investigated using transmission electron microscopy (TEM). The samples were heated in air for at least 16 hours at temperatures ranging from 773 K - 1273 K. On MgO supports, the BN thin film coating was lost by 1073 K due to a solid state reaction with the substrate leading to formation of Mg2B2O5. No such reaction occurred with the TiO2 substrate and the BN was stable even at 1273 K. However, the coating appeared to ball up and phase segregate into islands of near-graphitic BN and clumps of TiO2 (rutile). The oxidizing treatment appears to promote the transformation from turbostratic BN to graphitic BN.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 275
Copyright
Copyright © Materials Research Society 1992

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