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Orientation Relationships between BCC Deposits and FCC Substrates

Published online by Cambridge University Press:  25 February 2011

David A. Smith
Affiliation:
IBM Corporation, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598 USA
Armin Segmüller
Affiliation:
IBM Corporation, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598 USA
A. R. Taranko
Affiliation:
IBM Corporation, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598 USA
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Abstract

Oriented deposits are commonplace in vapor deposited films. The origins of this behavior are not always clear. Various bcc metals (Fe, Nb, Mo, Ta, Cr) have been deposited onto single crystal fcc substrates (Au, Ni, MgO, Si, NaCI) which were selected with the intention of varying the character of the substrate-deposit interaction. The resulting structures have been characterized by transmission electron microscopy and grazing incidence x-ray diffraction. The observed variants of the cube-cube and Nishiyama-Wassermann orientation relationship can be understood in terms of minimization of misfit except when there is a weak interaction between substrate and deposit.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

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