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Published online by Cambridge University Press: 10 February 2011
Multilayer structures with depth graded spacing can present a high reflectivity in a broad energy bandpass for hard X-rays (>20 keV) if the interface roughness/diffuseness is controlled and minimized. We present an optimization study of several multilayer systems deposited by DC magnetron sputtering on <111> silicon wafer substrates. The material combinations presented in this work are W/Si, W/C, Wsi2/Si, Pt/C, Ni/C, and Mo/Si.